Polysilanes: Photochemistry and deep UV lithography

Polysilanes: Photochemistry and deep UV lithography

The photochemistry of poly(cyclohexylmethylsilane) (PCHMS) has been studied, and PCHMS homopolymer has been shown to be useful for high resolution, deep UV pattern generation either by using a commercial 1:1 projection printer operating in the deep UV or by an excimer laser stepper at 248 nm. In the...

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Veröffentlicht in:Polymer engineering and science 1989-07, Vol.29 (13), p.882-886
Hauptverfasser: Miller, R. D., Wallraff, G., Clecak, N., Sooriyakumaran, R., Michl, J., Karatsu, T., McKinley, A. J., Klingensmith, K. A., Downing, J.
Format: Artikel
Sprache:eng
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Application fields
Applied sciences
Exact sciences and technology
Polymer industry, paints, wood
Technology of polymers
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Zusammenfassung:The photochemistry of poly(cyclohexylmethylsilane) (PCHMS) has been studied, and PCHMS homopolymer has been shown to be useful for high resolution, deep UV pattern generation either by using a commercial 1:1 projection printer operating in the deep UV or by an excimer laser stepper at 248 nm. In the case of the excimer laser stepper, images 0.5 μm and smaller have been printed, which represents an improvement over the 0.8 μm limit previously reported for polysilane copolymers.
ISSN:0032-3888
1548-2634
DOI:10.1002/pen.760291311