The reduction of reflective notches using "dyed" resist

Variation in line width caused by light scattered from the substrate (reflective notching) is a major problem in VLSI lithography. This paper demonstrates the reduction of reflective notches using a resist with increased absorptivity (a dyed resist). The optimal set of process conditions which minim...

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Veröffentlicht in:	Polymer engineering and science 1986-09, Vol.26 (16), p.1165-1170
Hauptverfasser:	Watts, Michael P. C., Debruin, David, Arnold, William H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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