Spiral inductors fabricated on multi-layered Bragg reflector for Si-based RF IC applications

Spiral inductors fabricated on multi-layered Bragg reflector for Si-based RF IC applications

In this paper, for the first time, a novel physical structure of planar spiral inductors fabricated on a multilayered Bragg reflector is proposed. The multilayered Bragg reflector (BR) was fabricated on Si substrate. The effects of the multilayered Bragg reflector and inductor patterns on the charac...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Microwave and optical technology letters 2006-07, Vol.48 (7), p.1296-1298
Hauptverfasser: Mai, Linh, Song, Hae-il, Minh Tuan, Le, Van Su, Pham, Yoon, Giwan
Format: Artikel
Sprache:eng
Schlagworte:
Bragg reflector
inductor layout
return loss (S11)
silicon substrate
spiral inductor
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1298
container_issue 7
container_start_page 1296
container_title Microwave and optical technology letters
container_volume 48
creator Mai, Linh
Song, Hae-il
Minh Tuan, Le
Van Su, Pham
Yoon, Giwan
description In this paper, for the first time, a novel physical structure of planar spiral inductors fabricated on a multilayered Bragg reflector is proposed. The multilayered Bragg reflector (BR) was fabricated on Si substrate. The effects of the multilayered Bragg reflector and inductor patterns on the characteristics of inductors are studied. The results show that the inductors fabricated on the Bragg reflector result in a significant improvement in terms of the S11‐parameter. This approach seems highly feasible and promising for future Si‐based RF IC applications. © 2006 Wiley Periodicals, Inc. Microwave Opt Technol Lett 48: 1296–1298, 2006; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21621
doi_str_mv 10.1002/mop.21621
format Article
fullrecord <record><control><sourceid>istex_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1002_mop_21621</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>ark_67375_WNG_F1J4LGH9_V</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2671-7c9841347063c6d8ad3aa86df667c48fb1b191d3e5b1ec12c871be0d35590b153</originalsourceid><addsrcrecordid>eNp1kE1PwzAMhiMEEmNw4B_kyiFbnLRJe4SJdUODIcbHBSlK03QKdGuVdIL9ezoG3DhYluznsawXoXOgA6CUDVd1M2AgGBygHtA0IUwKeoh6NEljwiIpj9FJCG-UUi4l66HXReO8rrBbFxvT1j7gUufeGd3aAtdrvNpUrSOV3lrfDa68Xi6xt2VldzAuu1o4kuvQLR_GeDrCummqne7qdThFR6Wugj376X30NL5-HE3IbJ5NR5czYpiQQKRJkwh4JKngRhSJLrjWiShKIaSJkjKHHFIouI1zsAaYSSTklhY8jlOaQ8z76GJ_1_g6hO491Xi30n6rgKpdLKqLRX3H0rHDPfvhKrv9H1S38_tfg-wNF1r7-Wdo_66E5DJWL3eZGsNNNMsmqXrmXy8mc2c</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Spiral inductors fabricated on multi-layered Bragg reflector for Si-based RF IC applications</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Mai, Linh ; Song, Hae-il ; Minh Tuan, Le ; Van Su, Pham ; Yoon, Giwan</creator><creatorcontrib>Mai, Linh ; Song, Hae-il ; Minh Tuan, Le ; Van Su, Pham ; Yoon, Giwan</creatorcontrib><description>In this paper, for the first time, a novel physical structure of planar spiral inductors fabricated on a multilayered Bragg reflector is proposed. The multilayered Bragg reflector (BR) was fabricated on Si substrate. The effects of the multilayered Bragg reflector and inductor patterns on the characteristics of inductors are studied. The results show that the inductors fabricated on the Bragg reflector result in a significant improvement in terms of the S11‐parameter. This approach seems highly feasible and promising for future Si‐based RF IC applications. © 2006 Wiley Periodicals, Inc. Microwave Opt Technol Lett 48: 1296–1298, 2006; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21621</description><identifier>ISSN: 0895-2477</identifier><identifier>EISSN: 1098-2760</identifier><identifier>DOI: 10.1002/mop.21621</identifier><language>eng</language><publisher>Hoboken: Wiley Subscription Services, Inc., A Wiley Company</publisher><subject>Bragg reflector ; inductor layout ; return loss (S11) ; silicon substrate ; spiral inductor</subject><ispartof>Microwave and optical technology letters, 2006-07, Vol.48 (7), p.1296-1298</ispartof><rights>Copyright © 2006 Wiley Periodicals, Inc.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c2671-7c9841347063c6d8ad3aa86df667c48fb1b191d3e5b1ec12c871be0d35590b153</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fmop.21621$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fmop.21621$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,778,782,1414,27911,27912,45561,45562</link.rule.ids></links><search><creatorcontrib>Mai, Linh</creatorcontrib><creatorcontrib>Song, Hae-il</creatorcontrib><creatorcontrib>Minh Tuan, Le</creatorcontrib><creatorcontrib>Van Su, Pham</creatorcontrib><creatorcontrib>Yoon, Giwan</creatorcontrib><title>Spiral inductors fabricated on multi-layered Bragg reflector for Si-based RF IC applications</title><title>Microwave and optical technology letters</title><addtitle>Microw. Opt. Technol. Lett</addtitle><description>In this paper, for the first time, a novel physical structure of planar spiral inductors fabricated on a multilayered Bragg reflector is proposed. The multilayered Bragg reflector (BR) was fabricated on Si substrate. The effects of the multilayered Bragg reflector and inductor patterns on the characteristics of inductors are studied. The results show that the inductors fabricated on the Bragg reflector result in a significant improvement in terms of the S11‐parameter. This approach seems highly feasible and promising for future Si‐based RF IC applications. © 2006 Wiley Periodicals, Inc. Microwave Opt Technol Lett 48: 1296–1298, 2006; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21621</description><subject>Bragg reflector</subject><subject>inductor layout</subject><subject>return loss (S11)</subject><subject>silicon substrate</subject><subject>spiral inductor</subject><issn>0895-2477</issn><issn>1098-2760</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNp1kE1PwzAMhiMEEmNw4B_kyiFbnLRJe4SJdUODIcbHBSlK03QKdGuVdIL9ezoG3DhYluznsawXoXOgA6CUDVd1M2AgGBygHtA0IUwKeoh6NEljwiIpj9FJCG-UUi4l66HXReO8rrBbFxvT1j7gUufeGd3aAtdrvNpUrSOV3lrfDa68Xi6xt2VldzAuu1o4kuvQLR_GeDrCummqne7qdThFR6Wugj376X30NL5-HE3IbJ5NR5czYpiQQKRJkwh4JKngRhSJLrjWiShKIaSJkjKHHFIouI1zsAaYSSTklhY8jlOaQ8z76GJ_1_g6hO491Xi30n6rgKpdLKqLRX3H0rHDPfvhKrv9H1S38_tfg-wNF1r7-Wdo_66E5DJWL3eZGsNNNMsmqXrmXy8mc2c</recordid><startdate>200607</startdate><enddate>200607</enddate><creator>Mai, Linh</creator><creator>Song, Hae-il</creator><creator>Minh Tuan, Le</creator><creator>Van Su, Pham</creator><creator>Yoon, Giwan</creator><general>Wiley Subscription Services, Inc., A Wiley Company</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>200607</creationdate><title>Spiral inductors fabricated on multi-layered Bragg reflector for Si-based RF IC applications</title><author>Mai, Linh ; Song, Hae-il ; Minh Tuan, Le ; Van Su, Pham ; Yoon, Giwan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2671-7c9841347063c6d8ad3aa86df667c48fb1b191d3e5b1ec12c871be0d35590b153</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Bragg reflector</topic><topic>inductor layout</topic><topic>return loss (S11)</topic><topic>silicon substrate</topic><topic>spiral inductor</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mai, Linh</creatorcontrib><creatorcontrib>Song, Hae-il</creatorcontrib><creatorcontrib>Minh Tuan, Le</creatorcontrib><creatorcontrib>Van Su, Pham</creatorcontrib><creatorcontrib>Yoon, Giwan</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><jtitle>Microwave and optical technology letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mai, Linh</au><au>Song, Hae-il</au><au>Minh Tuan, Le</au><au>Van Su, Pham</au><au>Yoon, Giwan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Spiral inductors fabricated on multi-layered Bragg reflector for Si-based RF IC applications</atitle><jtitle>Microwave and optical technology letters</jtitle><addtitle>Microw. Opt. Technol. Lett</addtitle><date>2006-07</date><risdate>2006</risdate><volume>48</volume><issue>7</issue><spage>1296</spage><epage>1298</epage><pages>1296-1298</pages><issn>0895-2477</issn><eissn>1098-2760</eissn><abstract>In this paper, for the first time, a novel physical structure of planar spiral inductors fabricated on a multilayered Bragg reflector is proposed. The multilayered Bragg reflector (BR) was fabricated on Si substrate. The effects of the multilayered Bragg reflector and inductor patterns on the characteristics of inductors are studied. The results show that the inductors fabricated on the Bragg reflector result in a significant improvement in terms of the S11‐parameter. This approach seems highly feasible and promising for future Si‐based RF IC applications. © 2006 Wiley Periodicals, Inc. Microwave Opt Technol Lett 48: 1296–1298, 2006; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21621</abstract><cop>Hoboken</cop><pub>Wiley Subscription Services, Inc., A Wiley Company</pub><doi>10.1002/mop.21621</doi><tpages>3</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0895-2477
ispartof Microwave and optical technology letters, 2006-07, Vol.48 (7), p.1296-1298
issn 0895-2477
1098-2760
language eng
recordid cdi_crossref_primary_10_1002_mop_21621
source Wiley Online Library Journals Frontfile Complete
subjects Bragg reflector
inductor layout
return loss (S11)
silicon substrate
spiral inductor
title Spiral inductors fabricated on multi-layered Bragg reflector for Si-based RF IC applications
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T20%3A30%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-istex_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Spiral%20inductors%20fabricated%20on%20multi-layered%20Bragg%20reflector%20for%20Si-based%20RF%20IC%20applications&rft.jtitle=Microwave%20and%20optical%20technology%20letters&rft.au=Mai,%20Linh&rft.date=2006-07&rft.volume=48&rft.issue=7&rft.spage=1296&rft.epage=1298&rft.pages=1296-1298&rft.issn=0895-2477&rft.eissn=1098-2760&rft_id=info:doi/10.1002/mop.21621&rft_dat=%3Cistex_cross%3Eark_67375_WNG_F1J4LGH9_V%3C/istex_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true