Macromol. Rapid Commun. 12/2014
Front Cover: Making use of photodegradation: photooxidative chain‐scission of a precursor to poly(3,4‐diphenyl‐2,5‐thienylene vinylene) increases the solubility of the UV exposed areas, allowing for selective dissolution (a positive tone resist). The resulting pattern (the unexposed regions) retain...
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Veröffentlicht in: | Macromolecular rapid communications. 2014-06, Vol.35 (12), p.1085-1085 |
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container_title | Macromolecular rapid communications. |
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creator | Johnson, Ross S. Haworth, Jacob J. Finnegan, Patrick S. Wheeler, David R. Dirk, Shawn M. |
description | Front Cover: Making use of photodegradation: photooxidative chain‐scission of a precursor to poly(3,4‐diphenyl‐2,5‐thienylene vinylene) increases the solubility of the UV exposed areas, allowing for selective dissolution (a positive tone resist). The resulting pattern (the unexposed regions) retain pristine optical and electrical properties. The process results in single micron resolution of an insoluble active material. Further details can be found in the article by R. S. Johnson,* J. J. Haworth, P. S. Finnegan, D. R. Wheeler, and S. M. Dirk* on page 1116. |
doi_str_mv | 10.1002/marc.201470038 |
format | Article |
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subjects | conjugated polymers lithography patterning photochemistry |
title | Macromol. Rapid Commun. 12/2014 |
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