Macromol. Rapid Commun. 12/2014

Macromol. Rapid Commun. 12/2014

Front Cover: Making use of photodegradation: photooxidative chain‐scission of a precursor to poly(3,4‐diphenyl‐2,5‐thienylene vinylene) increases the solubility of the UV exposed areas, allowing for selective dissolution (a positive tone resist). The resulting pattern (the unexposed regions) retain...

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Veröffentlicht in:Macromolecular rapid communications. 2014-06, Vol.35 (12), p.1085-1085
Hauptverfasser: Johnson, Ross S., Haworth, Jacob J., Finnegan, Patrick S., Wheeler, David R., Dirk, Shawn M.
Format: Artikel
Sprache:eng
Schlagworte:
conjugated polymers
lithography
patterning
photochemistry
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Zusammenfassung:Front Cover: Making use of photodegradation: photooxidative chain‐scission of a precursor to poly(3,4‐diphenyl‐2,5‐thienylene vinylene) increases the solubility of the UV exposed areas, allowing for selective dissolution (a positive tone resist). The resulting pattern (the unexposed regions) retain pristine optical and electrical properties. The process results in single micron resolution of an insoluble active material. Further details can be found in the article by R. S. Johnson,* J. J. Haworth, P. S. Finnegan, D. R. Wheeler, and S. M. Dirk* on page 1116.
ISSN:1022-1336
1521-3927
DOI:10.1002/marc.201470038