Fabrication of Stable Chiral Polyaniline Nanocomposite-Based Patterns
We report an artful method to form a stable pattern of chiral polyaniline nanocomposites (CPANs). It consists of the preparation of a diazoresin (DR)/poly(acrylic acid) (PAA) thin buffer layer on an Si substrate by self‐assembly, followed by the deposition of a multi‐layer film by spin‐assembly, lea...
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Veröffentlicht in: | Macromolecular rapid communications. 2005-02, Vol.26 (3), p.192-195 |
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creator | Yang, Linglu Yang, Zhaohui Cao, Weixiao |
description | We report an artful method to form a stable pattern of chiral polyaniline nanocomposites (CPANs). It consists of the preparation of a diazoresin (DR)/poly(acrylic acid) (PAA) thin buffer layer on an Si substrate by self‐assembly, followed by the deposition of a multi‐layer film by spin‐assembly, leading to the formation of a (DR/PAA)2DR/(CPAN/DR)n film on the substrate. After selective exposure to UV light through a photomask and the development process, a defined pattern is formed.
Scanning electron microscopy image of the patterned (CPAN/DR)5 thin film on Si wafer. |
doi_str_mv | 10.1002/marc.200400497 |
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Scanning electron microscopy image of the patterned (CPAN/DR)5 thin film on Si wafer.</description><identifier>ISSN: 1022-1336</identifier><identifier>EISSN: 1521-3927</identifier><identifier>DOI: 10.1002/marc.200400497</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Applied sciences ; chiral ; diazoresin ; Exact sciences and technology ; pattern ; Physicochemistry of polymers ; polyaniline nanocomposites ; Polymers and radiations ; Properties and characterization ; self-assembly ; spin-assembly</subject><ispartof>Macromolecular rapid communications., 2005-02, Vol.26 (3), p.192-195</ispartof><rights>Copyright © 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><rights>2005 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3577-b089d457139b7f77fa034fd92387c86451115f5e4c454ae3fb86af0c4af59053</citedby><cites>FETCH-LOGICAL-c3577-b089d457139b7f77fa034fd92387c86451115f5e4c454ae3fb86af0c4af59053</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fmarc.200400497$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,27901,27902,45551</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16555527$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Yang, Linglu</creatorcontrib><creatorcontrib>Yang, Zhaohui</creatorcontrib><creatorcontrib>Cao, Weixiao</creatorcontrib><title>Fabrication of Stable Chiral Polyaniline Nanocomposite-Based Patterns</title><title>Macromolecular rapid communications.</title><addtitle>Macromol. Rapid Commun</addtitle><description>We report an artful method to form a stable pattern of chiral polyaniline nanocomposites (CPANs). It consists of the preparation of a diazoresin (DR)/poly(acrylic acid) (PAA) thin buffer layer on an Si substrate by self‐assembly, followed by the deposition of a multi‐layer film by spin‐assembly, leading to the formation of a (DR/PAA)2DR/(CPAN/DR)n film on the substrate. After selective exposure to UV light through a photomask and the development process, a defined pattern is formed.
Scanning electron microscopy image of the patterned (CPAN/DR)5 thin film on Si wafer.</description><subject>Applied sciences</subject><subject>chiral</subject><subject>diazoresin</subject><subject>Exact sciences and technology</subject><subject>pattern</subject><subject>Physicochemistry of polymers</subject><subject>polyaniline nanocomposites</subject><subject>Polymers and radiations</subject><subject>Properties and characterization</subject><subject>self-assembly</subject><subject>spin-assembly</subject><issn>1022-1336</issn><issn>1521-3927</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNqFkM1Lw0AQxRdRsFavnnPxmLqf2eyx1rYKaS1aELwsk-0urqZJ2Q1o_3tTIurNYWDm8H5vmIfQJcEjgjG93kIwI4ox71rJIzQggpKUKSqPux1TmhLGslN0FuMbxjjnmA7QdAZl8AZa39RJ45KnFsrKJpNXH6BKVk21h9pXvrbJEurGNNtdE31r0xuIdpOsoG1tqOM5OnFQRXvxPYdoPZuuJ3dp8TC_n4yL1DAhZVriXG24kISpUjopHWDG3UZRlkuTZ1wQQoQTlhsuOFjmyjwDhw0HJxQWbIhGva0JTYzBOr0Lvnt7rwnWhwz0IQP9k0EHXPXADqKBygWojY-_VCa6oged6nUfvrL7f1z1Yvw4-Xsj7VkfW_v5w0J415lkUujn5Vy_3JJCsQXWBfsCq3R8Bg</recordid><startdate>20050203</startdate><enddate>20050203</enddate><creator>Yang, Linglu</creator><creator>Yang, Zhaohui</creator><creator>Cao, Weixiao</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><general>Wiley</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20050203</creationdate><title>Fabrication of Stable Chiral Polyaniline Nanocomposite-Based Patterns</title><author>Yang, Linglu ; Yang, Zhaohui ; Cao, Weixiao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3577-b089d457139b7f77fa034fd92387c86451115f5e4c454ae3fb86af0c4af59053</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Applied sciences</topic><topic>chiral</topic><topic>diazoresin</topic><topic>Exact sciences and technology</topic><topic>pattern</topic><topic>Physicochemistry of polymers</topic><topic>polyaniline nanocomposites</topic><topic>Polymers and radiations</topic><topic>Properties and characterization</topic><topic>self-assembly</topic><topic>spin-assembly</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yang, Linglu</creatorcontrib><creatorcontrib>Yang, Zhaohui</creatorcontrib><creatorcontrib>Cao, Weixiao</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Macromolecular rapid communications.</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yang, Linglu</au><au>Yang, Zhaohui</au><au>Cao, Weixiao</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of Stable Chiral Polyaniline Nanocomposite-Based Patterns</atitle><jtitle>Macromolecular rapid communications.</jtitle><addtitle>Macromol. Rapid Commun</addtitle><date>2005-02-03</date><risdate>2005</risdate><volume>26</volume><issue>3</issue><spage>192</spage><epage>195</epage><pages>192-195</pages><issn>1022-1336</issn><eissn>1521-3927</eissn><abstract>We report an artful method to form a stable pattern of chiral polyaniline nanocomposites (CPANs). It consists of the preparation of a diazoresin (DR)/poly(acrylic acid) (PAA) thin buffer layer on an Si substrate by self‐assembly, followed by the deposition of a multi‐layer film by spin‐assembly, leading to the formation of a (DR/PAA)2DR/(CPAN/DR)n film on the substrate. After selective exposure to UV light through a photomask and the development process, a defined pattern is formed.
Scanning electron microscopy image of the patterned (CPAN/DR)5 thin film on Si wafer.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/marc.200400497</doi><tpages>4</tpages></addata></record> |
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subjects | Applied sciences chiral diazoresin Exact sciences and technology pattern Physicochemistry of polymers polyaniline nanocomposites Polymers and radiations Properties and characterization self-assembly spin-assembly |
title | Fabrication of Stable Chiral Polyaniline Nanocomposite-Based Patterns |
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