Fabrication of Stable Chiral Polyaniline Nanocomposite-Based Patterns

We report an artful method to form a stable pattern of chiral polyaniline nanocomposites (CPANs). It consists of the preparation of a diazoresin (DR)/poly(acrylic acid) (PAA) thin buffer layer on an Si substrate by self‐assembly, followed by the deposition of a multi‐layer film by spin‐assembly, leading to the formation of a (DR/PAA)2DR/(CPAN/DR)n film on the substrate. After selective exposure to UV light through a photomask and the development process, a defined pattern is formed. Scanning electron microscopy image of the patterned (CPAN/DR)5 thin film on Si wafer.