Complex structure formation in thin microlithographic coating systems

A characteristic sequence of structures is observed during the curing process of bilayer systems of thin films of novolak and poly(vinyl alcohol). Patterns arise spontaneously in such thin film systems heated above 140°C. At first, cell‐like structures are formed followed by wave and ripple patterns. The temporal order of the formed features is in opposition to the well‐known order of dissipative structures of coupled hydrodynamical instabilities. The rate of pattern formation strongly increases with temperature and thickness of the novolak sublayer. The character of the final pattern depends on this film thickness, too.