Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?

Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?

Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophen...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:European journal of inorganic chemistry 2014-02, Vol.2014 (6), p.950-950
Hauptverfasser: Sundberg, Pia, Karppinen, Maarit
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 950
container_issue 6
container_start_page 950
container_title European journal of inorganic chemistry
container_volume 2014
creator Sundberg, Pia
Karppinen, Maarit
description Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophenol as precursors.
doi_str_mv 10.1002/ejic.201400081
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1002_ejic_201400081</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1002_ejic_201400081</sourcerecordid><originalsourceid>FETCH-LOGICAL-c841-feff91a01889d55fe4721004ed880a74e5426cf64d3a23d4b8b90c4b7bdd84c23</originalsourceid><addsrcrecordid>eNo9kM1Kw0AcxBdRsFavnv8vkLqb3aYbLxJS-wEp9ZB72OyH3ZJky25FCh76CIJv2CcxpeJp5jAzMD-EHgkeEYzjJ721chRjwjDGnFyhAcFpGuGEx9e9Z5RFJGX8Ft2FsO0jFNNkgL7W_l10Vp6OP8vOXTyUG9vBzDZtAONdC6XNG2AgOgXsdPzOWtu53UZ3roE3r-WHD86HZ8hg5ZRuIBdBgzOQFdOnVTGFxaH2VvXFldhrb0UDc-8-95uXe3RjRBP0w58OUTl7LfNFVKznyzwrIskZiYw2JiUCE85TNR4bzSZxf5hpxTkWE6bHLE6kSZiiIqaK1bxOsWT1pFaKMxnTIRpdZqV3IXhtqp23rfCHiuDqjK46o6v-0dFfdk9kSg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?</title><source>Wiley Online Library All Journals</source><creator>Sundberg, Pia ; Karppinen, Maarit</creator><creatorcontrib>Sundberg, Pia ; Karppinen, Maarit</creatorcontrib><description>Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophenol as precursors.</description><identifier>ISSN: 1434-1948</identifier><identifier>EISSN: 1099-0682</identifier><identifier>DOI: 10.1002/ejic.201400081</identifier><language>eng</language><ispartof>European journal of inorganic chemistry, 2014-02, Vol.2014 (6), p.950-950</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c841-feff91a01889d55fe4721004ed880a74e5426cf64d3a23d4b8b90c4b7bdd84c23</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Sundberg, Pia</creatorcontrib><creatorcontrib>Karppinen, Maarit</creatorcontrib><title>Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?</title><title>European journal of inorganic chemistry</title><description>Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophenol as precursors.</description><issn>1434-1948</issn><issn>1099-0682</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNo9kM1Kw0AcxBdRsFavnv8vkLqb3aYbLxJS-wEp9ZB72OyH3ZJky25FCh76CIJv2CcxpeJp5jAzMD-EHgkeEYzjJ721chRjwjDGnFyhAcFpGuGEx9e9Z5RFJGX8Ft2FsO0jFNNkgL7W_l10Vp6OP8vOXTyUG9vBzDZtAONdC6XNG2AgOgXsdPzOWtu53UZ3roE3r-WHD86HZ8hg5ZRuIBdBgzOQFdOnVTGFxaH2VvXFldhrb0UDc-8-95uXe3RjRBP0w58OUTl7LfNFVKznyzwrIskZiYw2JiUCE85TNR4bzSZxf5hpxTkWE6bHLE6kSZiiIqaK1bxOsWT1pFaKMxnTIRpdZqV3IXhtqp23rfCHiuDqjK46o6v-0dFfdk9kSg</recordid><startdate>201402</startdate><enddate>201402</enddate><creator>Sundberg, Pia</creator><creator>Karppinen, Maarit</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>201402</creationdate><title>Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?</title><author>Sundberg, Pia ; Karppinen, Maarit</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c841-feff91a01889d55fe4721004ed880a74e5426cf64d3a23d4b8b90c4b7bdd84c23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sundberg, Pia</creatorcontrib><creatorcontrib>Karppinen, Maarit</creatorcontrib><collection>CrossRef</collection><jtitle>European journal of inorganic chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sundberg, Pia</au><au>Karppinen, Maarit</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?</atitle><jtitle>European journal of inorganic chemistry</jtitle><date>2014-02</date><risdate>2014</risdate><volume>2014</volume><issue>6</issue><spage>950</spage><epage>950</epage><pages>950-950</pages><issn>1434-1948</issn><eissn>1099-0682</eissn><abstract>Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophenol as precursors.</abstract><doi>10.1002/ejic.201400081</doi><tpages>1</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1434-1948
ispartof European journal of inorganic chemistry, 2014-02, Vol.2014 (6), p.950-950
issn 1434-1948
1099-0682
language eng
recordid cdi_crossref_primary_10_1002_ejic_201400081
source Wiley Online Library All Journals
title Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T18%3A53%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Organic%E2%80%93Inorganic%20Thin%20Films%20from%20TiCl%204%20and%204%E2%80%90Aminophenol%20Precursors:%20A%20Model%20Case%20of%20ALD/MLD%20Hybrid%E2%80%90Material%20Growth?&rft.jtitle=European%20journal%20of%20inorganic%20chemistry&rft.au=Sundberg,%20Pia&rft.date=2014-02&rft.volume=2014&rft.issue=6&rft.spage=950&rft.epage=950&rft.pages=950-950&rft.issn=1434-1948&rft.eissn=1099-0682&rft_id=info:doi/10.1002/ejic.201400081&rft_dat=%3Ccrossref%3E10_1002_ejic_201400081%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true