Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?

Organic–Inorganic Thin Films from TiCl 4 and 4‐Aminophenol Precursors: A Model Case of ALD/MLD Hybrid‐Material Growth?

Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophen...

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Veröffentlicht in:European journal of inorganic chemistry 2014-02, Vol.2014 (6), p.950-950
Hauptverfasser: Sundberg, Pia, Karppinen, Maarit
Format: Artikel
Sprache:eng
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Zusammenfassung:Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti–O–C 6 H 4 –N=) n ‐type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl 4 and 4‐aminophenol as precursors.
ISSN:1434-1948
1099-0682
DOI:10.1002/ejic.201400081