Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds

CuCl reacts with Na[HB(R3R5pz)3] and phosphine (PR3) or isonitrile (CNR) to yield volatile (pyrazolylborate)copper(I) complexes. These compounds were evaluated as MOCVD precursors. Using [{HB(pz)3}Cu(PEt3)] and [{HB(pz)3}Cu(PMe3)], thin copper films were grown by thermal metal organic chemical vapor...

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Veröffentlicht in:	Chemical vapor deposition 1997-02, Vol.3 (1), p.37-43
Hauptverfasser:	Plappert, Elisabeth-Charlotte, Stumm, Thomas, van den Bergh, Herbert, Hauert, Roland, Dahmen, Klaus-Hermann
Format:	Artikel
Sprache:	eng
Schlagworte:	Copper MOCVD Precursor Pyrazolyborate
Online-Zugang:	Volltext
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