ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate

ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate

ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “Refer...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:ChemInform 2002-04, Vol.33 (13)
Hauptverfasser: Park, Jaehoo, Park, Byoung Keon, Cho, Moonju, Hwang, Cheol Seong, Oh, Kiyoung, Yang, Doo Young
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 13
container_start_page
container_title ChemInform
container_volume 33
creator Park, Jaehoo
Park, Byoung Keon
Cho, Moonju
Hwang, Cheol Seong
Oh, Kiyoung
Yang, Doo Young
description ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “References” option.
doi_str_mv 10.1002/chin.200213018
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1002_chin_200213018</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1002_chin_200213018</sourcerecordid><originalsourceid>FETCH-crossref_primary_10_1002_chin_2002130183</originalsourceid><addsrcrecordid>eNqVkE1OwzAQhS0EEuFny3oukGA7atOyQ4Go3QBSC9vItcbEKImjsQuCFUfgFByMk-BUwJ7VjJ7efPP0GDsTPBOcy3Pd2D6TcRM5F7M9loiJlKmcTot9lvB5LtJiMi8O2ZH3T9GVFzOZsM-ywW7ZG0cdXG58IKXDBYyi1aqFBzU4giscnLfBuh6cgYW5BQnr-A0q23Ye7r3tH0HBjXvGFkpFG9d_vX9UhAh3hHpL3lEWoWqkI9k39csKDcKyj5pRGuHFhmYnrWxrdXSstrtIAU_YgVGtx9Ofecyy6npdLlJNzntCUw9kO0WvteD12EY9tlH_tZH_--AbPjhq-w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Park, Jaehoo ; Park, Byoung Keon ; Cho, Moonju ; Hwang, Cheol Seong ; Oh, Kiyoung ; Yang, Doo Young</creator><creatorcontrib>Park, Jaehoo ; Park, Byoung Keon ; Cho, Moonju ; Hwang, Cheol Seong ; Oh, Kiyoung ; Yang, Doo Young</creatorcontrib><description>ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “References” option.</description><identifier>ISSN: 0931-7597</identifier><identifier>EISSN: 1522-2667</identifier><identifier>DOI: 10.1002/chin.200213018</identifier><language>eng</language><ispartof>ChemInform, 2002-04, Vol.33 (13)</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-crossref_primary_10_1002_chin_2002130183</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids></links><search><creatorcontrib>Park, Jaehoo</creatorcontrib><creatorcontrib>Park, Byoung Keon</creatorcontrib><creatorcontrib>Cho, Moonju</creatorcontrib><creatorcontrib>Hwang, Cheol Seong</creatorcontrib><creatorcontrib>Oh, Kiyoung</creatorcontrib><creatorcontrib>Yang, Doo Young</creatorcontrib><title>ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate</title><title>ChemInform</title><description>ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “References” option.</description><issn>0931-7597</issn><issn>1522-2667</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNqVkE1OwzAQhS0EEuFny3oukGA7atOyQ4Go3QBSC9vItcbEKImjsQuCFUfgFByMk-BUwJ7VjJ7efPP0GDsTPBOcy3Pd2D6TcRM5F7M9loiJlKmcTot9lvB5LtJiMi8O2ZH3T9GVFzOZsM-ywW7ZG0cdXG58IKXDBYyi1aqFBzU4giscnLfBuh6cgYW5BQnr-A0q23Ye7r3tH0HBjXvGFkpFG9d_vX9UhAh3hHpL3lEWoWqkI9k39csKDcKyj5pRGuHFhmYnrWxrdXSstrtIAU_YgVGtx9Ofecyy6npdLlJNzntCUw9kO0WvteD12EY9tlH_tZH_--AbPjhq-w</recordid><startdate>20020402</startdate><enddate>20020402</enddate><creator>Park, Jaehoo</creator><creator>Park, Byoung Keon</creator><creator>Cho, Moonju</creator><creator>Hwang, Cheol Seong</creator><creator>Oh, Kiyoung</creator><creator>Yang, Doo Young</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20020402</creationdate><title>ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate</title><author>Park, Jaehoo ; Park, Byoung Keon ; Cho, Moonju ; Hwang, Cheol Seong ; Oh, Kiyoung ; Yang, Doo Young</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-crossref_primary_10_1002_chin_2002130183</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Park, Jaehoo</creatorcontrib><creatorcontrib>Park, Byoung Keon</creatorcontrib><creatorcontrib>Cho, Moonju</creatorcontrib><creatorcontrib>Hwang, Cheol Seong</creatorcontrib><creatorcontrib>Oh, Kiyoung</creatorcontrib><creatorcontrib>Yang, Doo Young</creatorcontrib><collection>CrossRef</collection><jtitle>ChemInform</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Park, Jaehoo</au><au>Park, Byoung Keon</au><au>Cho, Moonju</au><au>Hwang, Cheol Seong</au><au>Oh, Kiyoung</au><au>Yang, Doo Young</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate</atitle><jtitle>ChemInform</jtitle><date>2002-04-02</date><risdate>2002</risdate><volume>33</volume><issue>13</issue><issn>0931-7597</issn><eissn>1522-2667</eissn><abstract>ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “References” option.</abstract><doi>10.1002/chin.200213018</doi></addata></record>
fulltext fulltext
identifier ISSN: 0931-7597
ispartof ChemInform, 2002-04, Vol.33 (13)
issn 0931-7597
1522-2667
language eng
recordid cdi_crossref_primary_10_1002_chin_200213018
source Wiley Online Library Journals Frontfile Complete
title ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T08%3A43%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=ChemInform%20Abstract:%20Chemical%20Vapor%20Deposition%20of%20HfO%202%20Thin%20Films%20Using%20a%20Novel%20Carbon%E2%80%90Free%20Precursor.%20Characterization%20of%20the%20Interface%20with%20the%20Silicon%20Substrate&rft.jtitle=ChemInform&rft.au=Park,%20Jaehoo&rft.date=2002-04-02&rft.volume=33&rft.issue=13&rft.issn=0931-7597&rft.eissn=1522-2667&rft_id=info:doi/10.1002/chin.200213018&rft_dat=%3Ccrossref%3E10_1002_chin_200213018%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true