ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate

ChemInform Abstract: Chemical Vapor Deposition of HfO 2 Thin Films Using a Novel Carbon‐Free Precursor. Characterization of the Interface with the Silicon Substrate

ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “Refer...

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Veröffentlicht in:ChemInform 2002-04, Vol.33 (13)
Hauptverfasser: Park, Jaehoo, Park, Byoung Keon, Cho, Moonju, Hwang, Cheol Seong, Oh, Kiyoung, Yang, Doo Young
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
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Zusammenfassung:ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “References” option.
ISSN:0931-7597
1522-2667
DOI:10.1002/chin.200213018