Characterization of poly(N-(hydroxymethyl)methacrylamide-ATU) hydrogels synthesized by γ radiation

Poly(N‐(hydroxymethyl)methacrylamide‐1‐allyl‐2‐thiourea), (poly(NHMMA‐ATU)) hydrogels were synthesized by γ radiation, using 60Co γ source at different radiation doses, to change the porosity and crosslinking density of the hydrogels. The percent of 1‐allyl‐2‐thiourea (ATU) in the monomer mixture be...

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Veröffentlicht in:Journal of applied polymer science 2006-02, Vol.99 (4), p.1657-1664
Hauptverfasser: Şahiner, Nurettin, Çelikbıçak, Ömür, Malcı, Savaş, Kantoǧlu, Ömer, Salih, Bekir
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Sprache:eng
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Zusammenfassung:Poly(N‐(hydroxymethyl)methacrylamide‐1‐allyl‐2‐thiourea), (poly(NHMMA‐ATU)) hydrogels were synthesized by γ radiation, using 60Co γ source at different radiation doses, to change the porosity and crosslinking density of the hydrogels. The percent of 1‐allyl‐2‐thiourea (ATU) in the monomer mixture before the irradiation was varied between 2.5% and 10.0%, to increase the content of ATU, which was involved in some different applications in the hydrogels. Fourier transform infrared spectroscopy (FTIR), thermogravimetric analysis (TGA), elemental analysis, and the swelling experiments were used to characterize the poly(NHMMA‐ATU) hydrogels synthesized in this study. Characterization results of hydrogels showed that crosslinking density of the hydrogels was increased by the increasing radiation dose and ATU content in the irradiated mixture. Swellability of these hydrogels was found to be high enough to allow the metal ions and biomolecules getting inside the hydrogels to interact with all active groups on/in the hydrogels in the adsorption applications. Equilibrium swelling ratio of the hydrogels at pH 0.5 is at least half of the equilibrium swelling ratio of the hydrogels at pH 7.0. Oscillatory swelling behavior of poly(NHMMA‐ATU) hydrogels between pH 0.5 and pH 7.0 showed that the hydrogels are quite stable at different pH conditions. © 2005 Wiley Periodicals, Inc. J Appl Polym Sci 99: 1657–1664, 2006
ISSN:0021-8995
1097-4628
DOI:10.1002/app.22462