Effects of CF 4 /O 2 gas plasma power/exposure time on dielectric properties and breakdown voltages of PVDF films
Dielectric properties and electrical breakdown strengths were measured on 12‐μm‐thick poly(vinylidene fluoride) films before and after exposure to various power levels and exposure times in a 96% CF 4 /4% O 2 gas plasma. Significant changes in dielectric constant, dielectric losses, and breakdown vo...
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| Veröffentlicht in: | Journal of applied polymer science 1992-11, Vol.46 (9), p.1535-1538 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | Dielectric properties and electrical breakdown strengths were measured on 12‐μm‐thick poly(vinylidene fluoride) films before and after exposure to various power levels and exposure times in a 96% CF
4
/4% O
2
gas plasma. Significant changes in dielectric constant, dielectric losses, and breakdown voltages were observed. Breakdown voltages for PVDF films as a function of exposure time and plasma power appear to go through a maximum. © 1992 John Wiley & Sons, Inc. |
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| ISSN: | 0021-8995 1097-4628 |
| DOI: | 10.1002/app.1992.070460903 |