Plasma polymerization of organosiloxanes

Plasma polymerization of disiloxanes containing various functional groups—hexamethyldisiloxane (HMDSO), tetramethyl‐1,3‐bis(chloromethyl)‐disiloxane (CMDSO), tetramethyl‐1,3‐bis(hydroxylbutyl)‐disiloxane (HBDSO), and tetramethyl‐1,3‐bis(amino propyl)‐disiloxane (APDSO)— was carried out using an indu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied polymer science 1992-01, Vol.44 (1), p.135-141
Hauptverfasser: Cai, Shide, Fang, Jianglin, Yu, Xuehai
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Plasma polymerization of disiloxanes containing various functional groups—hexamethyldisiloxane (HMDSO), tetramethyl‐1,3‐bis(chloromethyl)‐disiloxane (CMDSO), tetramethyl‐1,3‐bis(hydroxylbutyl)‐disiloxane (HBDSO), and tetramethyl‐1,3‐bis(amino propyl)‐disiloxane (APDSO)— was carried out using an inductively coupled electrodeless glow discharge. The monomer polymerization kinetics and the distribution of chemical species deposited showed that monomer reactivity varied among the different siloxanes. Monomers of APDSO and CMDSO possessed higher rates of polymerization. Polymer IR spectra and ESCA analyses indicated that the chemical structures of plasma‐polymerized products of HMDSO, HBDSO, and CMDSO resembled that of crosslinked polydimethylsiloxane. The polar hydroxyl and chlorine functionality in the HBDSO and CMDSO monomers was not present in the deposited films. In contrast, the polymerized product of APDSO retained amino functionality and also formed new Si–H bonds.
ISSN:0021-8995
1097-4628
DOI:10.1002/app.1992.070440114