A new method of evaluation of the effect of electron beam and developing process on positive polymeric resists

A new method of evalution of the effect of electron beam on the latent changes in degrading polymer resists has been developed on the base of measurement of the developing curve under an interference microscope. An evalution procedure using the unit parameters (film thickness and development time) h...

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Veröffentlicht in:	J. Appl. Polym. Sci.; (United States) 1984-04, Vol.29 (4), p.1427-1432
Hauptverfasser:	Pelzbauer, Z., Wagner, R.
Format:	Artikel
Sprache:	eng
Schlagworte:	360405 - Materials- Polymers & Plastics- Degradation & Erosion- (-1987) 400600 - Radiation Chemistry Ageing Applied sciences BEAMS CHEMICAL RADIATION EFFECTS CHEMISTRY DATA DIMENSIONS ELECTRON BEAMS Exact sciences and technology EXPERIMENTAL DATA INFORMATION IONIZING RADIATIONS LEPTON BEAMS MATERIALS SCIENCE NUMERICAL DATA ORGANIC COMPOUNDS ORGANIC POLYMERS PARTICLE BEAMS Physical properties Polymer industry, paints, wood POLYMERS Properties and testing RADIATION CHEMISTRY RADIATION CHEMISTRY, RADIOCHEMISTRY, AND NUCLEAR CHEMISTRY RADIATION EFFECTS RADIATIONS SENSITIVITY Technology of polymers THICKNESS TIME DEPENDENCE
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