Photoselective Processes in Cyclooctasulfur Layers: Desorption versus Polymerization

Since the desorption rate depends on the light intensity, a purely thermal desorption mechanism for a thin sulfur film at λ = 225 nm can be rejected. Nonthermal desorption of adsorbed cyclooctasulfur was hitherto unknown. By contrast, at λ = 328 and 382 nm only a small amount of light‐induced desorption was detected. Instead, polymerization of sulfur was observed at these wavelengths to significantly larger extent than at λ = 255 nm.