Hexa-tert-butyldisilane-the Molecule with the Longest SiSi Bond

Steric repulsion of the tert‐butyl groups in the disilane 2 results in a Si‐Si distance about 35 pm greater than that usually found in disilanes. 2 is formed via a radical intermediate upon reaction of nitrosyl cations with 1, MNa, K.

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Angewandte Chemie International Edition 1986-01, Vol.25 (1), p.79-80
Hauptverfasser:	Wiberg, Nils, Schuster, Harald, Simon, Arndt, Peters, Karl
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Steric repulsion of the tert‐butyl groups in the disilane 2 results in a Si‐Si distance about 35 pm greater than that usually found in disilanes. 2 is formed via a radical intermediate upon reaction of nitrosyl cations with 1, MNa, K.
ISSN:	0570-0833 1521-3773
DOI:	10.1002/anie.198600791