Synergetic thermodynamic/kinetic separation of C 3 H 8 / CH 3 F on carbon adsorbents for ultrapure fluoromethane electronic gas

Atomic layer etching (ALE) using the environmentally friendly electronic gas fluoromethane (CH 3 F) is guided for fabricating nanoscale electronic components. The adsorptive purification of CH 3 F provide a viable direction to remove trace amounts of impurities to produce highly pure CH 3 F (>99.9999%) for the ALE process. Herein, to remove trace propane (~100 ppm) in CH 3 F, we report synergetic thermodynamic and kinetic separation of C 3 H 8 /CH 3 F over glucose‐derived carbon molecular sieve CMS‐T, (T as pyrolysis temperature). With pore size slightly larger than the kinetic diameter of C 3 H 8 , CMS‐600 allows both strong confined adsorption of C 3 H 8 and a higher diffusion rate of C 3 H 8 over CH 3 F, resulting in a remarkable separation factor of 51.1. Breakthrough experiment demonstrates a high dynamic production capacity of 457 L kg −1 of 7 N CH 3 F (