Unveiling the Synergistic Role of Frustrated Lewis Pairs in Carbon-Encapsulated Ni/NiO x Photothermal Cocatalyst for Enhanced Photocatalytic Hydrogen Production
The development of high-density and closely spaced frustrated Lewis pairs (FLPs) is crucial for enhancing catalyst activity and accelerating reaction rates. However, constructing efficient FLPs by breaking classical Lewis bonds poses a significant challenge. Here, this work has made a pivotal discov...
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Veröffentlicht in: | Advanced materials (Weinheim) 2024-06, Vol.36 (24), p.e2313513 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The development of high-density and closely spaced frustrated Lewis pairs (FLPs) is crucial for enhancing catalyst activity and accelerating reaction rates. However, constructing efficient FLPs by breaking classical Lewis bonds poses a significant challenge. Here, this work has made a pivotal discovery regarding the Jahn-Teller effect during the formation of grain boundaries in carbon-encapsulated Ni/NiOx (Ni/NiO
@C). This effect facilitates the formation of high-density O (V
) and Ni (V
) vacancy sites with different charge polarities, specifically FLP-V
-C basic sites and FLP-V
-C acidic sites. The synergistic interaction between FLP-V
-C and FLP-V
-C sites not only reduces energy barriers for water adsorption and splitting, but also induces a strong photothermal effect. This mutually reinforcing effect contributes to the exceptional performance of Ni/NiO
@C as a cocatalyst in photothermal-assisted photocatalytic hydrogen production. Notably, the Ni/NiO
@C/g-C
N
(NOCC) composite photocatalyst exhibits remarkable hydrogen production activity with a rate of 10.7 mmol g
h
, surpassing that of the Pt cocatalyst by 1.76 times. Moreover, the NOCC achieves an impressive apparent quantum yield of 40.78% at a wavelength of 380 nm. This work paves the way for designing novel defect-state multiphase cocatalysts with high-density and adjacent FLP sites, which hold promise for enhancing various catalytic reactions. |
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ISSN: | 0935-9648 1521-4095 |
DOI: | 10.1002/adma.202313513 |