Salt-Induced High-Density Vacancy-Rich 2D MoS 2 for Efficient Hydrogen Evolution
Emerging non-noble metal 2D catalysts, such as molybdenum disulfide (MoS ), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing...
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Veröffentlicht in: | Advanced materials (Weinheim) 2024-04, Vol.36 (17), p.e2304808 |
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Hauptverfasser: | , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Emerging non-noble metal 2D catalysts, such as molybdenum disulfide (MoS
), hold great promise in hydrogen evolution reactions. The sulfur vacancy is recognized as a key defect type that can activate the inert basal plane to improve the catalytic performance. Unfortunately, the method of introducing sulfur vacancies is limited and requires costly post-treatment processes. Here, a novel salt-assisted chemical vapor deposition (CVD) method is demonstrated for synthesizing ultrahigh-density vacancy-rich 2H-MoS
, with a controllable sulfur vacancy density of up to 3.35 × 10
cm
. This approach involves a pre-sprayed potassium chloridepromoter on the growth substrate. The generation of such defects is closely related to ion adsorption in the growth process, the unstable MoS
-K-H
O triggers the formation of sulfur vacancies during the subsequent transfer process, and it is more controllable and nondestructive when compared to traditional post-treatment methods. The vacancy-rich monolayer MoS
exhibits exceptional catalytic activity based on the microcell measurements, with an overpotential of ≈158.8 mV (100 mA cm
) and a Tafel slope of 54.3 mV dec
in 0.5 m H
SO
electrolyte. These results indicate a promising opportunity for modulating sulfur vacancy defects in MoS
using salt-assisted CVD growth. This approach represents a significant leap toward achieving better control over the catalytic performances of 2D materials. |
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ISSN: | 0935-9648 1521-4095 |
DOI: | 10.1002/adma.202304808 |