Nanotransfer Printing with sub-10 nm Resolution Realized using Directed Self-Assembly

An extraordinarily facile sub‐10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self‐assembly of block copolymers is introduced. The approach is realized by achieving the uniform self‐assembly of polydimethylsiloxane (PDMS)‐containing block copolymers on a PDMS mold through the stabilization of the block copolymer thin films. This simple printing method can be applied on oxides, metals, polymers, and non‐planar substrates without pretreatments. The fabrication of well‐aligned metallic and polymeric functional nanostructures and crossed wire structures is also presented.