Overview of Ruthenium Thin Films Annealed by Microsecond Scanning UV Pulsed Laser: Structural, Electrical, and Failure Modes Analysis

Overview of Ruthenium Thin Films Annealed by Microsecond Scanning UV Pulsed Laser: Structural, Electrical, and Failure Modes Analysis

Ruthenium (Ru) has been identified as a durable and relevant substitute to copper (Cu) to answer the access resistance lowering of the back‐end‐of‐line (BEOL) metal levels, which is a high‐priority concern for future devices. Herein, the nonequilibrium and local properties of pulsed scanning laser a...

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Veröffentlicht in:Advanced engineering materials 2025-01
Hauptverfasser: Daubriac, Richard, Cancellara, Leonardo, Chehadi, Zeinab, Lu, Lu, Thuries, Louis, Khaled, Mohamed Ali, Roze, Fabien, Jourdan, Nicolas, Tokei, Zsolt, Descamps‐Mandine, Armel, Hungria, Teresa, Fazzini, Pier‐Francesco, Tabata, Toshiyuki, Huet, Karim
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Sprache:eng
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Zusammenfassung:Ruthenium (Ru) has been identified as a durable and relevant substitute to copper (Cu) to answer the access resistance lowering of the back‐end‐of‐line (BEOL) metal levels, which is a high‐priority concern for future devices. Herein, the nonequilibrium and local properties of pulsed scanning laser annealing (SLA) technique are used to enhance the structural and electrical properties of thin polycrystalline Ru layers (
ISSN:1438-1656
1527-2648
DOI:10.1002/adem.202402656