HIGH TEMPERATURE ESR PROPERTIES OF P, B-DOPED a-Si1-xCx:H FILMS
<正> Ⅰ. INTRODUCTION Hydrogenated amorphous silicon-carbon (a-Si1-xCx:H) film is an important amorphous photoelectric semiconductor material having a wide and variable band gap. It reduces the interface reflection and surface absorption of incident light when it is
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Veröffentlicht in: | 科学通报:英文版 1988 (21), p.1767-1771 |
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Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | <正> Ⅰ. INTRODUCTION Hydrogenated amorphous silicon-carbon (a-Si1-xCx:H) film is an important amorphous photoelectric semiconductor material having a wide and variable band gap. It reduces the interface reflection and surface absorption of incident light when it is |
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ISSN: | 2095-9273 |