ELECTROCHEMICAL INVESTIGATION OF GaAs HETEROSTRUCTURE MATERIALS

<正> The Ⅲ-Ⅴ compound semiconductor devices such as FET, laser, solar cell, etc. were developed recently. These devices require materials of multiple heterojunction and p-n junction structures. But it is impossible to determine their carrier concentration, layer thickness and the positi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:科学通报:英文版 1982 (10), p.1057-1062
1. Verfasser: 陈自姚 邵永富 彭瑞伍
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1062
container_issue 10
container_start_page 1057
container_title 科学通报:英文版
container_volume
creator 陈自姚 邵永富 彭瑞伍
description <正> The Ⅲ-Ⅴ compound semiconductor devices such as FET, laser, solar cell, etc. were developed recently. These devices require materials of multiple heterojunction and p-n junction structures. But it is impossible to determine their carrier concentration, layer thickness and the position of p-n junction simultaneously by general C-V method and the Hall measurement. In this aspect some progress has been made by electrochemical methods, nevertheless, the measurement of carrier concentration profile and the position of p-n junction of heterostructure materials have not yet been reported.
format Article
fullrecord <record><control><sourceid>chongqing</sourceid><recordid>TN_cdi_chongqing_primary_74888487495756504948484854</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><cqvip_id>74888487495756504948484854</cqvip_id><sourcerecordid>74888487495756504948484854</sourcerecordid><originalsourceid>FETCH-chongqing_primary_748884874957565049484848543</originalsourceid><addsrcrecordid>eNqdi8EKgjAYgHcoSMp32AsIS7e2nWKMXx1ogzm7ikSZUVZ66u0r6AniO3x8h2-GgphIFsmYJwsUTtOFELKmMqaEB2gLBWjvrM6hNFoV2Oz2UHmTKW_sDtsUZ62acA4enK28q7WvHeBSfdqoolqh-am9Tsfw5yVKUvA6jw7n-9A9-6FrHmN_a8dXw6kQggpOJeNswwiVVHxhNPnvegPSQjm2</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>ELECTROCHEMICAL INVESTIGATION OF GaAs HETEROSTRUCTURE MATERIALS</title><source>Alma/SFX Local Collection</source><creator>陈自姚 邵永富 彭瑞伍</creator><creatorcontrib>陈自姚 邵永富 彭瑞伍</creatorcontrib><description>&amp;lt;正&amp;gt; The Ⅲ-Ⅴ compound semiconductor devices such as FET, laser, solar cell, etc. were developed recently. These devices require materials of multiple heterojunction and p-n junction structures. But it is impossible to determine their carrier concentration, layer thickness and the position of p-n junction simultaneously by general C-V method and the Hall measurement. In this aspect some progress has been made by electrochemical methods, nevertheless, the measurement of carrier concentration profile and the position of p-n junction of heterostructure materials have not yet been reported.</description><identifier>ISSN: 2095-9273</identifier><language>eng</language><subject>junction;illumination;impossible;breakdown;dissolution;Profiles;tightly;illustrate;pressed;corder</subject><ispartof>科学通报:英文版, 1982 (10), p.1057-1062</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://image.cqvip.com/vip1000/qk/86894X/86894X.jpg</thumbnail><link.rule.ids>314,776,780,4009</link.rule.ids></links><search><creatorcontrib>陈自姚 邵永富 彭瑞伍</creatorcontrib><title>ELECTROCHEMICAL INVESTIGATION OF GaAs HETEROSTRUCTURE MATERIALS</title><title>科学通报:英文版</title><addtitle>A Monthly Journal of Science</addtitle><description>&amp;lt;正&amp;gt; The Ⅲ-Ⅴ compound semiconductor devices such as FET, laser, solar cell, etc. were developed recently. These devices require materials of multiple heterojunction and p-n junction structures. But it is impossible to determine their carrier concentration, layer thickness and the position of p-n junction simultaneously by general C-V method and the Hall measurement. In this aspect some progress has been made by electrochemical methods, nevertheless, the measurement of carrier concentration profile and the position of p-n junction of heterostructure materials have not yet been reported.</description><subject>junction;illumination;impossible;breakdown;dissolution;Profiles;tightly;illustrate;pressed;corder</subject><issn>2095-9273</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1982</creationdate><recordtype>article</recordtype><recordid>eNqdi8EKgjAYgHcoSMp32AsIS7e2nWKMXx1ogzm7ikSZUVZ66u0r6AniO3x8h2-GgphIFsmYJwsUTtOFELKmMqaEB2gLBWjvrM6hNFoV2Oz2UHmTKW_sDtsUZ62acA4enK28q7WvHeBSfdqoolqh-am9Tsfw5yVKUvA6jw7n-9A9-6FrHmN_a8dXw6kQggpOJeNswwiVVHxhNPnvegPSQjm2</recordid><startdate>1982</startdate><enddate>1982</enddate><creator>陈自姚 邵永富 彭瑞伍</creator><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>~WA</scope></search><sort><creationdate>1982</creationdate><title>ELECTROCHEMICAL INVESTIGATION OF GaAs HETEROSTRUCTURE MATERIALS</title><author>陈自姚 邵永富 彭瑞伍</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-chongqing_primary_748884874957565049484848543</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1982</creationdate><topic>junction;illumination;impossible;breakdown;dissolution;Profiles;tightly;illustrate;pressed;corder</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>陈自姚 邵永富 彭瑞伍</creatorcontrib><collection>中文科技期刊数据库</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>中文科技期刊数据库-7.0平台</collection><collection>中文科技期刊数据库- 镜像站点</collection><jtitle>科学通报:英文版</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>陈自姚 邵永富 彭瑞伍</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>ELECTROCHEMICAL INVESTIGATION OF GaAs HETEROSTRUCTURE MATERIALS</atitle><jtitle>科学通报:英文版</jtitle><addtitle>A Monthly Journal of Science</addtitle><date>1982</date><risdate>1982</risdate><issue>10</issue><spage>1057</spage><epage>1062</epage><pages>1057-1062</pages><issn>2095-9273</issn><abstract>&amp;lt;正&amp;gt; The Ⅲ-Ⅴ compound semiconductor devices such as FET, laser, solar cell, etc. were developed recently. These devices require materials of multiple heterojunction and p-n junction structures. But it is impossible to determine their carrier concentration, layer thickness and the position of p-n junction simultaneously by general C-V method and the Hall measurement. In this aspect some progress has been made by electrochemical methods, nevertheless, the measurement of carrier concentration profile and the position of p-n junction of heterostructure materials have not yet been reported.</abstract></addata></record>
fulltext fulltext
identifier ISSN: 2095-9273
ispartof 科学通报:英文版, 1982 (10), p.1057-1062
issn 2095-9273
language eng
recordid cdi_chongqing_primary_74888487495756504948484854
source Alma/SFX Local Collection
subjects junction
illumination
impossible
breakdown
dissolution
Profiles
tightly
illustrate
pressed
corder
title ELECTROCHEMICAL INVESTIGATION OF GaAs HETEROSTRUCTURE MATERIALS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T05%3A20%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-chongqing&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=ELECTROCHEMICAL%20INVESTIGATION%20OF%20GaAs%20HETEROSTRUCTURE%20MATERIALS&rft.jtitle=%E7%A7%91%E5%AD%A6%E9%80%9A%E6%8A%A5%EF%BC%9A%E8%8B%B1%E6%96%87%E7%89%88&rft.au=%E9%99%88%E8%87%AA%E5%A7%9A%20%E9%82%B5%E6%B0%B8%E5%AF%8C%20%E5%BD%AD%E7%91%9E%E4%BC%8D&rft.date=1982&rft.issue=10&rft.spage=1057&rft.epage=1062&rft.pages=1057-1062&rft.issn=2095-9273&rft_id=info:doi/&rft_dat=%3Cchongqing%3E74888487495756504948484854%3C/chongqing%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_cqvip_id=74888487495756504948484854&rfr_iscdi=true