A 2.05 eV AIGaInP sub-cell used in next generation solar cells

An Al0.13GalnP sub-cell used as the top cell in the next generation of high efficiency multi-junction solar cells is fabricated. An efficiency of 10.04% with 1457.3 mV in Voc and 11.9 mA/cm2 in Isc was obtained. QE comparison was carried out to verify the influence of an O-related defect introduced...

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Veröffentlicht in:半导体学报:英文版 2014 (9), p.83-86
1. Verfasser: 陆宏波 李欣益 张玮 周大勇 石梦奇 孙利杰 陈开建
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Sprache:eng
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Zusammenfassung:An Al0.13GalnP sub-cell used as the top cell in the next generation of high efficiency multi-junction solar cells is fabricated. An efficiency of 10.04% with 1457.3 mV in Voc and 11.9 mA/cm2 in Isc was obtained. QE comparison was carried out to verify the influence of an O-related defect introduced by the high Al-content materials on the cell performance during MOCVD growth. Hetero-structures are employed to confirm the origin of the decreasing short circuit current density compared to a GalnP single junction solar cell. An effective method to improve the performance of broadband solar cells by increasing Isc with a cost of Voc was proposed.
ISSN:1674-4926