THE THERMAL ANNEALING PROPERTIES OF CoMnNiO AMORPHOUS THIN FILM
CoMnNiO amorphous deposited by RF sputtering is an excellent thermally sensitive material for operating in wide temperature range. When annealed in various atmospheres, it shows different structures and electrical properties. In this article, XRD and ASR spectra of specimen annealed in O2 and Ar atm...
Gespeichert in:
Veröffentlicht in: | 中国科学通报:英文版 1991 (2), p.114-116 |
---|---|
1. Verfasser: | |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | CoMnNiO amorphous deposited by RF sputtering is an excellent thermally sensitive material for operating in wide temperature range. When annealed in various atmospheres, it shows different structures and electrical properties. In this article, XRD and ASR spectra of specimen annealed in O2 and Ar atmospheres are presented and the effects of the divorce of phase and crystallization on the structure and the electrical properties of the thin film are discussed. |
---|---|
ISSN: | 2095-9273 |