Characteristics in AlN/AlGaN/GaN Multilayer-Structured High-Electron-Mobility Transistors

A new multilayer-structured AlN/AlCaN/CaN heterostructure high-electron-mobility transistor (HEMT) is demonstrated. The AIN/AlCaN/CaN HEMT exhibits the maximum drain current density of 800mA/mm and the maximum extrinsic transconductance of 170 mS/mm. Due to the increase of the distance between the g...

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Veröffentlicht in:Chinese physics letters 2010, Vol.27 (8), p.183-185
1. Verfasser: 胡贵州 杨凌 杨丽媛 全思 姜守高 马骥刚 马晓华 郝跃
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Sprache:eng
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Zusammenfassung:A new multilayer-structured AlN/AlCaN/CaN heterostructure high-electron-mobility transistor (HEMT) is demonstrated. The AIN/AlCaN/CaN HEMT exhibits the maximum drain current density of 800mA/mm and the maximum extrinsic transconductance of 170 mS/mm. Due to the increase of the distance between the gate and the two-dimensional electron-gas channel, the threshold voltage shifts slightly to the negative. The reduced drain current collapse and higher breakdown voltage are observed on this AIN/AlGaN/CaN HEMT. The current gain cut-off frequency and the maximum frequency of oscillation are 18.5 CHz and 29.0 GHz, respectively.
ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/27/8/087301