Microstructure and physical properties of PVD TiN/(Ti, Al)N multilayer coatings

Magnetron sputtered (Ti, Al) N monolayer and TiN/(Ti, Al) N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), nanoindentation, Rockwell A indentation test, strength measurements and cutting t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Transactions of Nonferrous Metals Society of China 2005, Vol.15 (5), p.1072-1076
1. Verfasser: 吴恩熙 陈利 尹飞 汪秀全
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Magnetron sputtered (Ti, Al) N monolayer and TiN/(Ti, Al) N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), nanoindentation, Rockwell A indentation test, strength measurements and cutting tests. The results show that the (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings perform good affinity to substrate, and the TiN/(Ti, Al)N multilayer coating exhibits higher hardness, higher toughness and better cutting performance compared with the (Ti, Al)N monolayer coating. Moreover, the strength measurement indicates that the physical vapour deposition (PVD) coating has no effect on the substrate strength.
ISSN:1003-6326