Epitaxial aluminum layer on antimonide heterostructures for exploring Josephson junction effects

In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero $^o$C. A sharp superconducting transition at $T \sim 1.3$ K is observed in these epi-Al films, an...

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Hauptverfasser: Pan, W, Sapkota, K. R, Lu, P, Muhowski, A. J, Martinez, W. M, Sovinec, C. L. H, Reyna, R, Mendez, J. P, Mamaluy, D, Hawkins, S. D, Klem, J. F, Smith, L. S. L, Temple, D. A, Enderson, Z, Jiang, Z, Rossi, E
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Sprache:eng
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Zusammenfassung:In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero $^o$C. A sharp superconducting transition at $T \sim 1.3$ K is observed in these epi-Al films, and the critical magnetic field follows the BCS (Bardeen-Cooper-Schrieffer) model. We further show that supercurrent states are achieved in Josephson junctions fabricated in the epi-Al/antimonide heterostructures with mobility $\mu \sim 1.0 \times 10^6$ cm$^2$/Vs, making these heterostructures a promising platform for the exploration of Josephson junction effects for quantum microelectronics applications, and the realization of robust topological superconducting states that potentially allow the realization of intrinsically fault-tolerant qubits and quantum gates.
DOI:10.48550/arxiv.2410.06085