Improvement of temperature uniformity of induction-heated T-shape susceptor for high-temperature MOVPE

The induction heating is a common method applied in metalorganic vapor phase epitaxy (MOVPE) especially for higher-temperature growth conditions. However, compared to the susceptor heated by the multiple-zone resistant heater, the inductive-heated susceptor could suffer from severe thermal non-uniformity issue. In this simulation study, we propose to employ a T-shape susceptor design with various geometric modifications to significantly improve the substrate temperature uniformity by manipulating thermal transfer. Specifically, the thermal profile can be tailored by horizontal expansion and vertical elongation of the susceptor, or forming a cylindrical hollow structure at the susceptor bottom cylinder. Three optimized designs are shown with different temperature uniformity as well as various induction heating efficiencies. The temperature variation of the entire substrate surface can be less than 5 {\deg}C at ~1900 {\deg}C with high induction heating efficiency after applying the proposed techniques.