Pinning-induced pn junction formation in low-bandgap two-dimensional semiconducting systems

A model is presented for $pn$ junction formation near metal-semiconductor contacts in two-dimensional semiconducting systems such as graphene. Carrier type switching occurs in a region near the metal-semiconductor junction when energy band bending leads to a crossing between the junction Fermi level...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: Deen, David A
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A model is presented for $pn$ junction formation near metal-semiconductor contacts in two-dimensional semiconducting systems such as graphene. Carrier type switching occurs in a region near the metal-semiconductor junction when energy band bending leads to a crossing between the junction Fermi level and the Dirac energy. A bias-dependent depletion region occurs due to the minimization of carrier density, which is shown to act as an additional parasitic resistance in devices. The $pn$ junction resistance is demonstrated by its implementation in a transfer length structure.
DOI:10.48550/arxiv.1509.00250