Photochemistry of Matrix Isolated (Trifluoromethyl)sulfonyl Azide, CF3SO2N3

The photochemistry of matrix isolated (trifluoromethylsulfonyl) azide, CF3SO2N3, has been studied at low temperatures. Upon ArF laser irradiation (λ = 193 nm), the azide eliminates N2 and furnishes triplet [(trifluoromethyl)sulfonyl]nitrene, CF3SO2N, which has been characterized by IR and EPR spectr...

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Veröffentlicht in:	The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory Molecules, spectroscopy, kinetics, environment, & general theory, 2015-03, Vol.119 (11), p.2281-2288
Hauptverfasser:	Zeng, Xiaoqing, Beckers, Helmut, Willner, Helge, Neuhaus, Patrik, Grote, Dirk, Sander, Wolfram
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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Zusammenfassung:	The photochemistry of matrix isolated (trifluoromethylsulfonyl) azide, CF3SO2N3, has been studied at low temperatures. Upon ArF laser irradiation (λ = 193 nm), the azide eliminates N2 and furnishes triplet [(trifluoromethyl)sulfonyl]nitrene, CF3SO2N, which has been characterized by IR and EPR spectroscopy. Upon subsequent UV light irradiation (λ = 260–400 nm) the nitrene converts to CF3NSO2 and CF3S(O)NO through a Curtius-type rearrangement. Further two new species CF2NSO2F and FSNO were identified together with CF2NF, SO2, F2CO, CF3NO, and SO as side products. In addition, triplet nitrene CF3N was detected by its EPR and IR spectra. The complex stepwise photodecomposition of matrix isolated CF3SO2N3 is discussed in terms of the observed photolysis products and quantum chemical calculations.
ISSN:	1089-5639 1520-5215
DOI:	10.1021/jp506243s