Molecular Doping Control at a Topological Insulator Surface: F4‑TCNQ on Bi2Se3

Recent electrical measurements have accessed transport in the topological surface state band of thin exfoliated samples of Bi2Se3 by removing the bulk n-type doping by contact with thin films of the molecular acceptor F4-TCNQ. Here we report on the film growth and interfacial electronic characteriza...

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Veröffentlicht in:Journal of physical chemistry. C 2014-07, Vol.118 (27), p.14860-14865
Hauptverfasser: Wang, J, Hewitt, A. S, Kumar, R, Boltersdorf, J, Guan, T, Hunte, F, Maggard, P. A, Brom, J. E, Redwing, J. M, Dougherty, D. B
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Sprache:eng
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Zusammenfassung:Recent electrical measurements have accessed transport in the topological surface state band of thin exfoliated samples of Bi2Se3 by removing the bulk n-type doping by contact with thin films of the molecular acceptor F4-TCNQ. Here we report on the film growth and interfacial electronic characterization of F4-TCNQ grown on Bi2Se3. Atomic force microscopy shows wetting layer formation followed by 3D island growth. X-ray photoelectron spectroscopy is consistent with this picture and also shows that charge transferred to the molecular layer is localized on nitrogen atoms. Ultraviolet photoelectron spectroscopy shows a work function increase and an upward shift of the valence band edge that suggest significant reduction in carrier density at the Bi2Se3 surface.
ISSN:1932-7447
1932-7455
DOI:10.1021/jp412690h