Structural and Electrical Properties of ([SnSe]1+δ) m (NbSe2)1 Compounds: Single NbSe2 Layers Separated by Increasing Thickness of SnSe

The compounds ([SnSe]1+δ) m (NbSe2)1, where 1 ≤ m ≤ 10, were prepared from a series of designed precursors. The c-axis lattice parameter systematically increases by 0.577(5) nm as the value of m is increased, which indicates that an additional bilayer of rock salt structured SnSe is inserted for each unit of m. The in-plane structure of both constituents systematically changes as the thickness of SnSe increases. Both X-ray diffraction and electron microscopy studies show the presence of turbostratic disorder between the different constituent layers. The electrical resistivity and Hall coefficient increase systematically as a function of m stronger than would be expected for noninteracting metallic NbSe2 and semiconducting SnSe layers, suggesting the presence of charge transfer between the layers. The temperature dependence of the resistivity changes from metallic behavior for m < 4 to weakly increasing, for higher m, as temperature decreases. Compounds with m > 3 show an upturn in the resistivity below 50 K and a corresponding increase in the Hall coefficient, which both become more pronounced as m increases. This suggests localization of carriers, which is expected in two-dimensional crystals. The extent of charge transfer in ([SnSe]1+δ) m (NbSe2)1 can be tuned as a function of SnSe thickness and spans over the same range as reported in the literature for various NbX2 based intercalated and misfit layer compounds.