Selective Fabrication of Mott-Insulating and Metallic Monolayer TaSe2

We report the selective fabrication of monolayer TaSe2 with trigonal-prismatic (1H) or octahedral (1T) crystal structure on bilayer graphene by the molecular-beam-epitaxy method. By angle-resolved photoemission spectroscopy, we found that monolayer 1H-TaSe2 shows a metallic electronic structure with...

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Veröffentlicht in:ACS applied nano materials 2018-04, Vol.1 (4), p.1456-1460
Hauptverfasser: Nakata, Yuki, Yoshizawa, Takuya, Sugawara, Katsuaki, Umemoto, Yuki, Takahashi, Takashi, Sato, Takafumi
Format: Artikel
Sprache:eng
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Zusammenfassung:We report the selective fabrication of monolayer TaSe2 with trigonal-prismatic (1H) or octahedral (1T) crystal structure on bilayer graphene by the molecular-beam-epitaxy method. By angle-resolved photoemission spectroscopy, we found that monolayer 1H-TaSe2 shows a metallic electronic structure with a dispersive band across the Fermi level (E F) similar to the bulk crystal, while monolayer 1T-TaSe2 has a sizable energy gap at E F indicative of the insulating nature in contrast to the metallic nature of bulk 1T-TaSe2. We discuss the origin and implications of differences in the electronic structure among monolayer and bulk TaSe2 by comparing the experimental results with first-principles band-structure calculations as well as previous studies on bulk TaSe2.
ISSN:2574-0970
2574-0970
DOI:10.1021/acsanm.8b00184