Selective Fabrication of Mott-Insulating and Metallic Monolayer TaSe2
We report the selective fabrication of monolayer TaSe2 with trigonal-prismatic (1H) or octahedral (1T) crystal structure on bilayer graphene by the molecular-beam-epitaxy method. By angle-resolved photoemission spectroscopy, we found that monolayer 1H-TaSe2 shows a metallic electronic structure with...
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Veröffentlicht in: | ACS applied nano materials 2018-04, Vol.1 (4), p.1456-1460 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We report the selective fabrication of monolayer TaSe2 with trigonal-prismatic (1H) or octahedral (1T) crystal structure on bilayer graphene by the molecular-beam-epitaxy method. By angle-resolved photoemission spectroscopy, we found that monolayer 1H-TaSe2 shows a metallic electronic structure with a dispersive band across the Fermi level (E F) similar to the bulk crystal, while monolayer 1T-TaSe2 has a sizable energy gap at E F indicative of the insulating nature in contrast to the metallic nature of bulk 1T-TaSe2. We discuss the origin and implications of differences in the electronic structure among monolayer and bulk TaSe2 by comparing the experimental results with first-principles band-structure calculations as well as previous studies on bulk TaSe2. |
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ISSN: | 2574-0970 2574-0970 |
DOI: | 10.1021/acsanm.8b00184 |