Metal to Insulator Quantum-Phase Transition in Few-Layered ReS2

In ReS2, a layer-independent direct band gap of 1.5 eV implies a potential for its use in optoelectronic applications. ReS2 crystallizes in the 1T′-structure, which leads to anisotropic physical properties and whose concomitant electronic structure might host a nontrivial topology. Here, we report a...

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Veröffentlicht in:Nano letters 2015-12, Vol.15 (12), p.8377-8384
Hauptverfasser: Pradhan, Nihar R, McCreary, Amber, Rhodes, Daniel, Lu, Zhengguang, Feng, Simin, Manousakis, Efstratios, Smirnov, Dmitry, Namburu, Raju, Dubey, Madan, Hight Walker, Angela R, Terrones, Humberto, Terrones, Mauricio, Dobrosavljevic, Vladimir, Balicas, Luis
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Sprache:eng
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Zusammenfassung:In ReS2, a layer-independent direct band gap of 1.5 eV implies a potential for its use in optoelectronic applications. ReS2 crystallizes in the 1T′-structure, which leads to anisotropic physical properties and whose concomitant electronic structure might host a nontrivial topology. Here, we report an overall evaluation of the anisotropic Raman response and the transport properties of few-layered ReS2 field-effect transistors. We find that ReS2 exfoliated on SiO2 behaves as an n-type semiconductor with an intrinsic carrier mobility surpassing μi ∼ 30 cm2/(V s) at T = 300 K, which increases up to ∼350 cm2/(V s) at 2 K. Semiconducting behavior is observed at low electron densities n, but at high values of n the resistivity decreases by a factor of >7 upon cooling to 2 K and displays a metallic T 2-dependence. This suggests that the band structure of 1T′-ReS2 is quite susceptible to an electric field applied perpendicularly to the layers. The electric-field induced metallic state observed in transition metal dichalcogenides was recently claimed to result from a percolation type of transition. Instead, through a scaling analysis of the conductivity as a function of T and n, we find that the metallic state of ReS2 results from a second-order metal-to-insulator transition driven by electronic correlations. This gate-induced metallic state offers an alternative to phase engineering for producing ohmic contacts and metallic interconnects in devices based on transition metal dichalcogenides.
ISSN:1530-6984
1530-6992
DOI:10.1021/acs.nanolett.5b04100