In Situ Observation of Two-Dimensional Electron Gas Creation at the Interface of an Atomic Layer-Deposited Al2O3/TiO2 Thin-Film Heterostructure

In Situ Observation of Two-Dimensional Electron Gas Creation at the Interface of an Atomic Layer-Deposited Al2O3/TiO2 Thin-Film Heterostructure

A two-dimensional electron gas (2DEG) was formed at the interface of an ultrathin Al2O3/TiO2 heterostructure that was fabricated using atomic layer deposition (ALD) at a low temperature (

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Veröffentlicht in:Chemistry of materials 2020-09, Vol.32 (18), p.7662-7669
Hauptverfasser: Seok, Tae Jun, Liu, Yuhang, Choi, Ji Hyeon, Kim, Hye Ju, Kim, Dae Hyun, Kim, Sung Min, Jang, Jae Hyuck, Cho, Deok-Yong, Lee, Sang Woon, Park, Tae Joo
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Sprache:eng
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Zusammenfassung:A two-dimensional electron gas (2DEG) was formed at the interface of an ultrathin Al2O3/TiO2 heterostructure that was fabricated using atomic layer deposition (ALD) at a low temperature (
ISSN:0897-4756
1520-5002
DOI:10.1021/acs.chemmater.0c01572