Gas-Phase synthesis of nanoparticles
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[2017]
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| 245 | 1 | 0 | |a Gas-Phase synthesis of nanoparticles |c edited by Yves Huttel |
| 264 | 1 | |a Weinheim |b Wiley-VCH |c [2017] | |
| 264 | 4 | |c © 2017 | |
| 300 | |a xx, 395 Seiten |b Illustrationen, Diagramme (teilweise farbig) | ||
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| 650 | 0 | 7 | |a Gasphasenreaktion |0 (DE-588)4156043-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Nanopartikel |0 (DE-588)4333369-2 |2 gnd |9 rswk-swf |
| 653 | |a Chemie | ||
| 653 | |a Chemistry | ||
| 653 | |a Gasphase | ||
| 653 | |a Gasphasensynthese | ||
| 653 | |a Industrial Chemistry | ||
| 653 | |a Nanomaterial | ||
| 653 | |a Nanomaterialien | ||
| 653 | |a Nanomaterials | ||
| 653 | |a Nanopartikel | ||
| 653 | |a Nanotechnologie | ||
| 653 | |a Nanotechnology | ||
| 653 | |a Oberflächen- u. Kolloidchemie | ||
| 653 | |a Surface & Colloid Chemistry | ||
| 653 | |a Technische u. Industrielle Chemie | ||
| 655 | 7 | |0 (DE-588)4143413-4 |a Aufsatzsammlung |2 gnd-content | |
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| 776 | 0 | 8 | |i Erscheint auch als |n Online-Ausgabe, Mobi |z 978-3-527-69843-1 |
| 776 | 0 | 8 | |i Erscheint auch als |n Online-Ausgabe, oBook |z 978-3-527-69841-7 |
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| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-029726790 | |
Datensatz im Suchindex
| _version_ | 1819656838141968384 |
|---|---|
| adam_text | CONTENTS
LIST OF CONTRIBUTORS
XIII
PREFACE
XIX
PART I INTRODUCTION TO GAS PHASE AGGREGATION SOURCES
1
1 HISTORY, SOME BASICS, AND AN OUTLOOK
3
HELLMUT HABERLAND
1.1 INTRODUCTION 3
1.2 THREE TYPES OF GAS AGGREGATION SOURCES 5
1.3 DEVELOPMENT OF THE MAGNETRON CLUSTER SOURCE 6
1.4 DEPOSITION MACHINE AND MASS SPECTRA 9
1.5 SOME EXPERIMENTAL QUESTIONS 11
1.5.1 HOW DO THE CLUSTERS START GROWING? 11
1.5.2 THE ROLE OF SPUTTERED DIMERS 13
1.5.3 REDUCTION OF THE ENERGY OF THE IMPACTING AR+ IONS OWING TO CHARGE
EXCHANGE 13
1.5.4 FORMATION AND SHAPE OF THE RACETRACK 14
1.5.5 LOSS OF INTENSITY 14
1.6 DEPOSITION OF CLUSTERS WITH VARIABLE KINETIC ENERGY 14
1.7 OUTLOOK AND FUTURE DEVELOPMENT 17
ACKNOWLEDGMENTS 18
REFERENCES 18
2
PRINCIPLES OF GAS PHASE AGGREGATION
23
PATRICE MELINON
2.1 THE LANDSCAPE 23
2.2 STEP 2: NUCLEATION 24
2.2.1 FIRST PHASE TRANSITION, CRITICAL TEMPERATURE 24
2.2.2 CLASSICAL NUCLEATION THEORY 25
2.2.3 CNT FAILURE FOR METAL-LIKE AND COVALENT-LIKE BONDING
26
2.3 KINETIC NUCLEATION THEORY 26
2.3.1 CLASSICAL APPROACH: BIMOLECULAR REACTION 26
2.3.2 RRKM THEORY: STICKING COEFFICIENT 27
2.3.3 BEYOND 29
2.4 CLUSTERS IN REAL GASES 30
2.4.1 EQUILIBRIUM STATE: SATURATED VAPOR 30
2.5 S 1: ADIABATIC EXPANSION 31
2.6 S 1: SUPERSONIC BEAM WITH BUFFER GAS 33
2.7 SIZE DISTRIBUTION 33
2.7.1 GENERAL CASE 33
2.7.2 VON SMOLUCHOWSKI 34
2.7.2.1 STEP 3: PERFECT STICKING 34
2.7.2.2 STEP 4: COAGULATION 35
2.8 CONCLUSION 36
REFERENCES 37
3 TYPES OF CLUSTER SOURCES
39
JOSE A. DE TORO, PETERS. NORMILE, AND CHRISTOPHER BIN NS
3.1 HIGH-VACUUM FREE BEAM SOURCES 39
3.2 GENERIC ASPECTS OF DESIGN 39
3.3 SEEDED SUPERSONIC NOZZLE SOURCE (SSNS) 40
3.4 THERMAL GAS AGGREGATION SOURCE (TGAS) 42
3.5 SPUTTER GAS AGGREGATION SOURCE (SGAS) 42
3.6 LASER ABLATION SOURCE (LAS) 45
3.7 PULSED-ARC CLUSTER ION SOURCE (PACTS) 46
3.8 PULSED MICROPLASMA CLUSTER SOURCE (PMCS) 47
3.9 COMPARISON AND SPECIALIZATION OF SOURCES 48
REFERENCES 49
PART II MODIFICATIONS OF GAS PHASE AGGREGATION SOURCES
57
4 THE DOUBLE-LASER ABLATION SOURCE APPROACH
59
PIERO FERRARI, JAN VANBUEL, YEJUN LI, TING-WEI LIAO, EWALD JANSSENS,
AND PETER LIEVENS
4.1 INTRODUCTION 59
4.2 SOURCE DESCRIPTION 60
4.2.1 PARAMETERS INFLUENCING CLUSTER PRODUCTION 61
4.2.1.1 LASER ENERGY DENSITY 62
4.2.1.2 LASER AND GAS PULSE TIMINGS 63
4.2.1.3 CARRIER GAS PRESSURE 65
4.2.1.4 TARGET POSITION IN THE SOURCE 66
4.3 STUDIES ON BIMETALLIC CLUSTERS 66
4.3.1 SIZE-DEPENDENT PROPERTIES OF DOPED AU CLUSTERS 66
4.3.2 STABILITY PATTERNS OF ALPBN+ CLUSTERS 70
4.3.3 STRUCTURE AND ELECTRONIC PROPERTIES OF METAL-DOPED SI CLUSTERS 72
4.3.4 THE PRODUCTION OF AG-AU NANOALLOY CLUSTERS 72
4.4 CONCLUSIONS 74
ACKNOWLEDGMENTS 75
REFERENCES 75
5 IN-PLANE MULTIMAGNETRON APPROACH
79
GRANT E. JOHNSON AND JULIA LASKIN
5.1 INTRODUCTION 79
5.2 THE MULTITARGET SINGLE-MAGNETRON APPROACH 82
5.3 THE MULTIMAGNETRON APPROACH 86
5.4 SUMMARY 95
ACKNOWLEDGMENTS 96
REFERENCES 96
6 ADJUSTABLE MULTIMAGNETRON APPROACH
101
LIDIA MARTINEZ
6.1 INTRODUCTION 101
6.2 DESIGN AND NEW PARAMETERS OF MULTIMAGNETRON GAS AGGREGATION
SOURCES 104
6.3 POSSIBILITIES IN THE FABRICATION OF NANOPARTICLES WITH
MULTIMAGNETRON
APPROACH 106
6.3.1 HOMOGENEOUS NANOPARTICLES 106
6.3.2 HETEROGENEOUS NANOPARTICLES 107
6.3.2.1 ALLOYED NANOPARTICLES 109
6.3.2.2 CORE-SHELL NANOPARTICLES 110
6.4 SUMMARY, PERSPECTIVES, AND APPLICATIONS UE 7
ACKNOWLEDGMENTS 118
REFERENCES 118
7 HOLLOW CYLINDRICAL MAGNETRON
123
VITOR TOSHIYUKI ABRAO OIKO, ARTUR DOMINGUES TAVARES DE SA, AND VARLEI
RODRIGUES
7.1 INTRODUCTION 123
7.2 PROJECT DESIGN AND IMPLEMENTATION 124
7.3 CHARACTERIZATION 126
7.4 CLUSTER PRODUCTION 128
7.4.1 CLUSTER SOURCE 128
7.4.2 SIMPLE METAL NANOCLUSTERS 129
7.4.3 BINARY NANOCLUSTERS 130
7.5 ALTERNATIVE CYLINDRICAL GEOMETRIES FOR MAGNETRON SPUTTERING 131
7.6 CONCLUDING REMARKS 132
REFERENCES 133
8 HIGH-FLUX DC MAGNETRON SPUTTERING
137
MARCO CESAR MAICAS RAMOS AND MARFA DEL MAR SANZ LLUCH
8.1 INTRODUCTION 137
8.2 GAS FLOW 139
8.2.1 BEAM APERTURE 139
8.2.2 AERODYNAMIC LENSES 142
8.2.3 GAS PULSES 144
8.3 OXYGEN-ASSISTED SYNTHESIS 146
8.3.1 PULSED DC MAGNETRON SOURCES 146
8.4 ION BEAMS 148
8.4.1 ION COLLECTION 148
8.4.2 ION BEAM FOCUSING 151
8.5 CONCLUSIONS 152
REFERENCES 153
9 HIGH-FLUX METAL VAPOR CELL
155
GAIL N. LIES
9.1 INTRODUCTION 155
9.2 VAPOR CELL COMPONENTS 156
9.3 VAPOR PRESSURE 159
9.4 METHODS AND TECHNIQUES 163
9.4.1 MOLECULAR BEAM EPITAXY 163
9.4.2 ELECTRON BEAM EPITAXY 166
9.5 DEVICES USING METAL VAPOR CELLS 167
9.5.1 LEICESTER UNIVERSITY MESOSCOPIC PARTICLE SOURCE 167
9.5.2 MICROGRAVITY DEVICES 169
9.6 SUMMARY 171
REFERENCES 171
10 MICROWAVE PLASMA SYNTHESIS OF NANOPARTICLES
175
DIETER VOLLATH
10.1 INTRODUCTION 175
10.1.1 BASIC IDEAS 175
10.1.2 ENERGY TRANSFER IN A MICROWAVE PLASMA 176
10.1.3 FORMATION OF NANOPARTICLES IN A MICROWAVE PLASMA 179
10.2 BASIC DESIGN OF MICROWAVE PLASMA SYSTEMS AND RESULTING
PRODUCTS 187
10.3 REALIZATION OF MICROWAVE PLASMA SYSTEMS FOR SYNTHESIS OF COATED
NANOPARTICLES 195
10.4 CONCLUSIONS 199
REFERENCES 199
11 ENHANCED SYNTHESIS OF AGGREGATES BY REDUCED TEMPERATURE,
PULSED MAGNETRON SPUTTERING, AND PULSED BUFFER GAS
DELIVERY
203
VITEZSLAV STRANAK AND RAINER HIPPIER
11.1 INTRODUCTION TO NANOPARTICLE AGGREGATION 203
11.2 EXPERIMENT 204
11.3 KINETIC PHENOMENA DURING CLUSTER GROWTH 205
11.3.1 THERMALIZATION AFTER MAGNETRON SPUTTERING 205
11.3.2 DRIFT OF CLUSTERS 206
11.3.3 PASSAGE THROUGH AN ORIFICE 207
11.3.4 TEMPERATURE DEPENDENCE OF CLUSTER GROWTH 207
11.3.5 CLUSTER VELOCITY 209
11.3.6 CLUSTER CHARGE 211
11.4 PULSED SPUTTERING OF METAL TARGET 212
11.4.1 DC VERSUS DC-PULSED MAGNETRON SPUTTERING 213
11.4.2 EFFECT OF DUTY CYCLE 215
11.5 PULSED DELIVERY OF BUFFER GAS 216
11.5.1 PULSED-GAS DELIVERY AND EXPERIMENT 217
11.5.2 CLUSTER GROWTH DURING THE GAS PULSE 218
11.6 CLUSTER MASS FLUX IN A GAS DYNAMIC SYSTEM 221
11.7 CONCLUSIONS 223
ACKNOWLEDGMENTS 223
REFERENCES 223
12 HIGH-POWER PULSED PLASMAS
227
IRIS PILCH
12.1 BACKGROUND: HIGH-POWER IMPULSE MAGNETRON SPUTTERING 227
12.2 SYNTHESIS OF NANOPARTICLES USING HIGH-POWER PULSED PLASMAS 230
12.2.1 CHARGING OF NANOPARTICLES IN A PLASMA 231
12.2.2 NANOPARTICLE GROWTH 233
12.2.3 GROWTH OF NANOPARTICLES IN A PULSED PLASMA 234
12.3 SUMMARY AND OUTLOOK 239
REFERENCES 240
13 HIGH-PRESSURE AND REACTIVE GAS MAGNETRON SPUTTERING
243
LAKSHMI KOLIPAKA AND STEFAN VAJDA
13.1 INTRODUCTION 243
13.2 TYPES OF REACTIVE SPUTTERING 244
13.3 HYSTERESIS EFFECT IN DC REACTIVE SPUTTERING 244
13.4 METHODS TO OVERCOME HYSTERESIS 246
13.4.1 INCREASING THE PUMPING SPEED 246
13.4.2 PARTIAL PRESSURE CONTROL OF REACTIVE GAS 247
13.4.3 CATHODE VOLTAGE CONTROL 249
13.4.4 INCREASING THE TARGET-SUBSTRATE DISTANCE 249
13.4.5 USING A BAFFLE SYSTEM 250
13.4.6 PULSED REACTIVE GAS FLOW 250
13.5 ARCING IN REACTIVE SPUTTER DEPOSITION 251
13.6 METHODS TO OVERCOME ARCING PROBLEM 251
13.6.1 UNIPOLAR PULSED MAGNETRON SPUTTERING 252
13.6.2 BIPOLAR PULSED MAGNETRON SPUTTERING 252
13.6.2.1 USING A SINGLE MAGNETRON SOURCE 252
13.6.2.2 USING TWO MAGNETRON SOURCES 253
13.6.3 ELIMINATION OF ARCING USING SUBSTOICHIOMETRIC TARGETS 254
13.7 MODELING OF REACTIVE SPUTTERING 254
13.7.1 STEADY-STATE CONDITION AT THE TARGET SURFACE 254
13.7.2 STEADY-STATE CONDITION AT THE COLLECTING (SUBSTRATE) SURFACE 255
13.8 IMPLEMENTATION OF HIGH-PRESSURE AND REACTIVE GAS SPUTTERING IN GAS
AGGREGATION SOURCES (GASS) 257
13.8.1 PROPERTIES OF THE DEPOSITED NANOPARTICLES 259
13.8.2 INFLUENCE OF REACTIVE GAS 259
13.8.3 INFLUENCE OF MAGNETRON POWER 263
13.8.4 INFLUENCE OF PROCESS PARAMETERS 263
13.8.5 CONTINUOUS DC SUPPLY VERSUS PULSED DC POWER SUPPLY 263
13.9 CONCLUSION 264
ACKNOWLEDGMENT 264
REFERENCES 264
PART III IN-FLIGHT POST-GROWTH MANIPULATION OF
NANOPARTICLES
269
14 COATING
271
PANAGIOTIS GRAMMOTIKOPOULOS AND MUKHLES SOWWAN
14.1 CORE/SHELL NANOPARTICLES 271
14.2 FABRICATION METHODS 273
14.3 STRUCTURAL MODIFICATION VIA IN-FLIGHT COATING 278
14.4 SUMMARY 282
ACKNOWLEDGMENTS 282
REFERENCES 283
15 NANOSTRUCTURING, ORIENTATION, AND ANNEALING
287
BALAMURUGAN BALASUBRAMANIAN AND DAVID J. SELLMYER
15.1 INTRODUCTION AND SCOPE 287
15.2 CONTROL OF CRYSTAL STRUCTURES 287
15.2.1 PLASMA-CONDENSATION-TYPE CLUSTER DEPOSITION METHOD 288
15.2.2 DIRECT FORMATION OF MAGNETIC NANOPARTICLES WITH HIGH-ANISOTROPY
STRUCTURES 289
15.2.3 POSTGROWTH ANNEALING 290
15.2.4 GROWTH OF DIELECTRIC OXIDE NANOPARTICLES 291
15.2.5 ORIENTATION/ALIGNMENT OF MAGNETIC NANOPARTICLES 293
15.3 NANOSTRUCTURING 294
15.3.1 DIELECTRIC NANOCOMPOSITES 295
15.3.2 CLUSTER-ASSEMBLED EXCHANGE-COUPLED NANOSTRUCTURES 296
15.4 CONCLUSIONS 298
ACKNOWLEDGMENTS 299
REFERENCES 299
16 DEFLECTION AND MASS FILTERING
303
MARCEL DI VECE
16.1 INTRODUCTION 303
16.2 MAGNETIC DEFLECTION 305
16.3 THE TIME-OF-FLIGHT MASS FILTER 306
16.4 THE REFLECTION TOF MASS FILTER 308
16.5 THE QUADRUPOLE MASS FILTER 308
16.6 AERODYNAMIC LENSES 310
16.7 THE WIEN FILTER 312
16.8 MAGNETIC SECTOR 312
16.9 CLUSTER ION TRAPS 313
16.10 MATTER-WAVE INTERFEROMETRY 313
16.11 COMPARISON OF MASS FILTERS 314
16.12 MASS FILTERING REQUIREMENTS FOR APPLICATIONS 315
16.13 CONCLUSIONS 316
REFERENCES 317
17 IN-FLIGHT AND POSTDEPOSITION MANIPULATION OF MASS-FILTERED
NANOPARTICLES UNDER SOFT-LANDING CONDITIONS
323
JOACHIM BANSMANN, ARMIN KLEIBERT, HENDRIK BETTERMANN, AND MATHIAS
GETZLAFF
17.1 INTRODUCTION 323
17.2 IN-FLIGHT MANIPULATION OF CLUSTER BEAMS 325
17.2.1 BEAM SHAPING 325
17.2.2 MASS FILTERING 325
17.2.3 IN-FLIGHT PROCESSING 326
17.3 SOFT LANDING 327
17.3.1 CONTACT FORMATION AND RELATED PHENOMENA 327
17.3.2 VARIATION OF KINETIC ENERGIES 330
17.3.3 POSTDEPOSITION TREATMENT 331
17.4 SUMMARY 333
ACKNOWLEDGMENTS 334
REFERENCES 334
18
IN-FLIGHT ANALYSIS
339
SERGIO D ADDATO
18.1 INTRODUCTION 339
18.2 ELECTRON DIFFRACTION AND X-RAY SCATTERING ANALYSIS OF CLUSTERS AND
NANOPARTICLES 340
18.3 PHOTOELECTRON AND X-RAY ABSORPTION SPECTROSCOPY 345
18.4 MAGNETIC DEFLECTION EXPERIMENTS
350
18.5 X-RAY MAGNETIC CIRCULAR DICHROISM EXPERIMENTS 355
18.6 CONCLUSIONS 358
REFERENCES 358
PART IV PERSPECTIVES
365
19 NANO- AND MICROMANUFACTURING WITH NANOPARTICLES PRODUCED
IN THE GAS PHASE: AN EMERGING TOOL FOR FUNCTIONAL AND
LENGTH-SCALE INTEGRATION
367
PAOLO MILANI AND LUCA
G. BETTINI
19.1 INTRODUCTION 367
19.2 5/TE-SELECTED NANOPARTICLE DEPOSITION 369
19.3 SUPERSONIC CLUSTER BEAM DEPOSITION 370
19.4 SYSTEM INTEGRATION APPROACH BY SCBD 375
19.4.1 GAS MICROSENSORS 375
19.4.2 BIOSENSORS 377
19.4.3 ELECTROCHEMICAL DEVICES 378
19.5 CONCLUSIONS 380
REFERENCES 380
INDEX
387
|
| any_adam_object | 1 |
| author2 | Huttel, Yves |
| author2_role | edt |
| author2_variant | y h yh |
| author_GND | (DE-588)1133091415 |
| author_facet | Huttel, Yves |
| building | Verbundindex |
| bvnumber | BV044323366 |
| classification_rvk | VE 9850 ZN 3700 |
| ctrlnum | (OCoLC)992463926 (DE-599)DNB1116626969 |
| dewey-full | 540 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 540 - Chemistry and allied sciences |
| dewey-raw | 540 |
| dewey-search | 540 |
| dewey-sort | 3540 |
| dewey-tens | 540 - Chemistry and allied sciences |
| discipline | Chemie / Pharmazie Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| genre | (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV044323366 |
| illustrated | Illustrated |
| indexdate | 2024-12-24T05:57:15Z |
| institution | BVB |
| institution_GND | (DE-588)16179388-5 |
| isbn | 9783527340606 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029726790 |
| oclc_num | 992463926 |
| open_access_boolean | |
| owner | DE-11 DE-83 DE-20 DE-29T |
| owner_facet | DE-11 DE-83 DE-20 DE-29T |
| physical | xx, 395 Seiten Illustrationen, Diagramme (teilweise farbig) |
| publishDate | 2017 |
| publishDateSearch | 2017 |
| publishDateSort | 2017 |
| publisher | Wiley-VCH |
| record_format | marc |
| spellingShingle | Gas-Phase synthesis of nanoparticles Gasphasenreaktion (DE-588)4156043-7 gnd Nanopartikel (DE-588)4333369-2 gnd |
| subject_GND | (DE-588)4156043-7 (DE-588)4333369-2 (DE-588)4143413-4 |
| title | Gas-Phase synthesis of nanoparticles |
| title_auth | Gas-Phase synthesis of nanoparticles |
| title_exact_search | Gas-Phase synthesis of nanoparticles |
| title_full | Gas-Phase synthesis of nanoparticles edited by Yves Huttel |
| title_fullStr | Gas-Phase synthesis of nanoparticles edited by Yves Huttel |
| title_full_unstemmed | Gas-Phase synthesis of nanoparticles edited by Yves Huttel |
| title_short | Gas-Phase synthesis of nanoparticles |
| title_sort | gas phase synthesis of nanoparticles |
| topic | Gasphasenreaktion (DE-588)4156043-7 gnd Nanopartikel (DE-588)4333369-2 gnd |
| topic_facet | Gasphasenreaktion Nanopartikel Aufsatzsammlung |
| url | http://www.wiley-vch.de/publish/dt/books/ISBN978-3-527-34060-6/ http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=029726790&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT huttelyves gasphasesynthesisofnanoparticles AT wileyvch gasphasesynthesisofnanoparticles |