Optical lithography here is why

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: Lin, Burn Jeng 1942- (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Bellingham, Wash. SPIE 2010
Schriftenreihe:SPIE Press monograph PM190
Schlagworte:
Online-Zugang:DE-1050
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Beschreibung
Zusammenfassung:This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future
Beschreibung:1 online resource (xiv, 477 pages) illustrations
ISBN:9780819481825
DOI:10.1117/3.821000