Plasma Technology Fundamentals and Applications

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1. Verfasser: Capitelli, Mario (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Boston, MA Springer US 1992
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LEADER 00000nam a2200000zc 4500
001 BV042411619
003 DE-604
005 00000000000000.0
007 cr|uuu---uuuuu
008 150316s1992 xx o|||| 00||| eng d
020 |a 9781461534006  |c Online  |9 978-1-4615-3400-6 
020 |a 9781461365020  |c Print  |9 978-1-4613-6502-0 
024 7 |a 10.1007/978-1-4615-3400-6  |2 doi 
035 |a (OCoLC)863734683 
035 |a (DE-599)BVBBV042411619 
040 |a DE-604  |b ger  |e aacr 
041 0 |a eng 
049 |a DE-91  |a DE-83 
082 0 |a 539  |2 23 
084 |a PHY 000  |2 stub 
100 1 |a Capitelli, Mario  |e Verfasser  |4 aut 
245 1 0 |a Plasma Technology  |b Fundamentals and Applications  |c edited by Mario Capitelli, Claudine Gorse 
264 1 |a Boston, MA  |b Springer US  |c 1992 
300 |a 1 Online-Ressource (VIII, 224 p) 
336 |b txt  |2 rdacontent 
337 |b c  |2 rdamedia 
338 |b cr  |2 rdacarrier 
500 |a The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non­ equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non­ equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A. 
650 4 |a Physics 
650 4 |a Nuclear physics 
650 4 |a Computer engineering 
650 4 |a Atomic, Molecular, Optical and Plasma Physics 
650 4 |a Electrical Engineering 
650 4 |a Nuclear Physics, Heavy Ions, Hadrons 
650 4 |a Classical Continuum Physics 
650 0 7 |a Plasmatechnik  |0 (DE-588)4140353-8  |2 gnd  |9 rswk-swf 
655 7 |8 1\p  |0 (DE-588)1071861417  |a Konferenzschrift  |y 1991  |z Barga- Il Ciocco  |2 gnd-content 
689 0 0 |a Plasmatechnik  |0 (DE-588)4140353-8  |D s 
689 0 |8 2\p  |5 DE-604 
700 1 |a Gorse, Claudine  |e Sonstige  |4 oth 
856 4 0 |u https://doi.org/10.1007/978-1-4615-3400-6  |x Verlag  |3 Volltext 
912 |a ZDB-2-PHA 
912 |a ZDB-2-BAE 
940 1 |q ZDB-2-PHA_Archive 
883 1 |8 1\p  |a cgwrk  |d 20201028  |q DE-101  |u https://d-nb.info/provenance/plan#cgwrk 
883 1 |8 2\p  |a cgwrk  |d 20201028  |q DE-101  |u https://d-nb.info/provenance/plan#cgwrk 
943 1 |a oai:aleph.bib-bvb.de:BVB01-027847112 

Datensatz im Suchindex

DE-BY-TUM_katkey 2060939
_version_ 1820853550486388736
any_adam_object
author Capitelli, Mario
author_facet Capitelli, Mario
author_role aut
author_sort Capitelli, Mario
author_variant m c mc
building Verbundindex
bvnumber BV042411619
classification_tum PHY 000
collection ZDB-2-PHA
ZDB-2-BAE
ctrlnum (OCoLC)863734683
(DE-599)BVBBV042411619
dewey-full 539
dewey-hundreds 500 - Natural sciences and mathematics
dewey-ones 539 - Modern physics
dewey-raw 539
dewey-search 539
dewey-sort 3539
dewey-tens 530 - Physics
discipline Physik
doi_str_mv 10.1007/978-1-4615-3400-6
format Electronic
eBook
fullrecord <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03432nam a2200529zc 4500</leader><controlfield tag="001">BV042411619</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150316s1992 xx o|||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461534006</subfield><subfield code="c">Online</subfield><subfield code="9">978-1-4615-3400-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781461365020</subfield><subfield code="c">Print</subfield><subfield code="9">978-1-4613-6502-0</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-1-4615-3400-6</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)863734683</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042411619</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">539</subfield><subfield code="2">23</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 000</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Capitelli, Mario</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma Technology</subfield><subfield code="b">Fundamentals and Applications</subfield><subfield code="c">edited by Mario Capitelli, Claudine Gorse</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boston, MA</subfield><subfield code="b">Springer US</subfield><subfield code="c">1992</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (VIII, 224 p)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non­ equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non­ equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nuclear physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Computer engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Atomic, Molecular, Optical and Plasma Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electrical Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nuclear Physics, Heavy Ions, Hadrons</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Classical Continuum Physics</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="8">1\p</subfield><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1991</subfield><subfield code="z">Barga- Il Ciocco</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Gorse, Claudine</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-1-4615-3400-6</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-PHA</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-BAE</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-PHA_Archive</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027847112</subfield></datafield></record></collection>
genre 1\p (DE-588)1071861417 Konferenzschrift 1991 Barga- Il Ciocco gnd-content
genre_facet Konferenzschrift 1991 Barga- Il Ciocco
id DE-604.BV042411619
illustrated Not Illustrated
indexdate 2024-12-24T04:23:03Z
institution BVB
isbn 9781461534006
9781461365020
language English
oai_aleph_id oai:aleph.bib-bvb.de:BVB01-027847112
oclc_num 863734683
open_access_boolean
owner DE-91
DE-BY-TUM
DE-83
owner_facet DE-91
DE-BY-TUM
DE-83
physical 1 Online-Ressource (VIII, 224 p)
psigel ZDB-2-PHA
ZDB-2-BAE
ZDB-2-PHA_Archive
publishDate 1992
publishDateSearch 1992
publishDateSort 1992
publisher Springer US
record_format marc
spellingShingle Capitelli, Mario
Plasma Technology Fundamentals and Applications
Physics
Nuclear physics
Computer engineering
Atomic, Molecular, Optical and Plasma Physics
Electrical Engineering
Nuclear Physics, Heavy Ions, Hadrons
Classical Continuum Physics
Plasmatechnik (DE-588)4140353-8 gnd
subject_GND (DE-588)4140353-8
(DE-588)1071861417
title Plasma Technology Fundamentals and Applications
title_auth Plasma Technology Fundamentals and Applications
title_exact_search Plasma Technology Fundamentals and Applications
title_full Plasma Technology Fundamentals and Applications edited by Mario Capitelli, Claudine Gorse
title_fullStr Plasma Technology Fundamentals and Applications edited by Mario Capitelli, Claudine Gorse
title_full_unstemmed Plasma Technology Fundamentals and Applications edited by Mario Capitelli, Claudine Gorse
title_short Plasma Technology
title_sort plasma technology fundamentals and applications
title_sub Fundamentals and Applications
topic Physics
Nuclear physics
Computer engineering
Atomic, Molecular, Optical and Plasma Physics
Electrical Engineering
Nuclear Physics, Heavy Ions, Hadrons
Classical Continuum Physics
Plasmatechnik (DE-588)4140353-8 gnd
topic_facet Physics
Nuclear physics
Computer engineering
Atomic, Molecular, Optical and Plasma Physics
Electrical Engineering
Nuclear Physics, Heavy Ions, Hadrons
Classical Continuum Physics
Plasmatechnik
Konferenzschrift 1991 Barga- Il Ciocco
url https://doi.org/10.1007/978-1-4615-3400-6
work_keys_str_mv AT capitellimario plasmatechnologyfundamentalsandapplications
AT gorseclaudine plasmatechnologyfundamentalsandapplications