Handbook of VLSI microlithography principles, technology, and applications

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Format: Buch
Sprache:English
Veröffentlicht: Park Ridge, NJ [u.a.] Noyes Publ. [u.a.] 2001
Ausgabe:2. ed.
Schriftenreihe:Materials science and processing technology series
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LEADER 00000nam a2200000 c 4500
001 BV013350055
003 DE-604
005 20030502
007 t|
008 000919s2001 xxuad|| |||| 00||| eng d
020 |a 0815514441  |9 0-8155-1444-1 
035 |a (OCoLC)43591143 
035 |a (DE-599)BVBBV013350055 
040 |a DE-604  |b ger  |e rakwb 
041 0 |a eng 
044 |a xxu  |c US 
049 |a DE-703  |a DE-898  |a DE-M347  |a DE-634 
050 0 |a TK7874 
082 0 |a 621.3815/31  |2 21 
084 |a ZN 4170  |0 (DE-625)157366:  |2 rvk 
245 1 0 |a Handbook of VLSI microlithography  |b principles, technology, and applications  |c ed. by John N. Helbert 
250 |a 2. ed. 
264 1 |a Park Ridge, NJ [u.a.]  |b Noyes Publ. [u.a.]  |c 2001 
300 |a XXI, 1001 S.  |b Ill., graph. Darst. 
336 |b txt  |2 rdacontent 
337 |b n  |2 rdamedia 
338 |b nc  |2 rdacarrier 
490 0 |a Materials science and processing technology series 
650 4 |a Integrated circuits  |x Very large scale integration 
650 4 |a Microlithography 
650 0 7 |a Elektronenstrahllithografie  |0 (DE-588)4151897-4  |2 gnd  |9 rswk-swf 
650 0 7 |a Fotolithografie  |g Halbleitertechnologie  |0 (DE-588)4174516-4  |2 gnd  |9 rswk-swf 
650 0 7 |a VLSI  |0 (DE-588)4117388-0  |2 gnd  |9 rswk-swf 
650 0 7 |a Lithografie  |g Halbleitertechnologie  |0 (DE-588)4191584-7  |2 gnd  |9 rswk-swf 
689 0 0 |a VLSI  |0 (DE-588)4117388-0  |D s 
689 0 1 |a Lithografie  |g Halbleitertechnologie  |0 (DE-588)4191584-7  |D s 
689 0 |5 DE-604 
689 1 0 |a VLSI  |0 (DE-588)4117388-0  |D s 
689 1 1 |a Fotolithografie  |g Halbleitertechnologie  |0 (DE-588)4174516-4  |D s 
689 1 |8 1\p  |5 DE-604 
689 2 0 |a Elektronenstrahllithografie  |0 (DE-588)4151897-4  |D s 
689 2 |8 2\p  |5 DE-604 
700 1 |a Helbert, John N.  |e Sonstige  |4 oth 
883 1 |8 1\p  |a cgwrk  |d 20201028  |q DE-101  |u https://d-nb.info/provenance/plan#cgwrk 
883 1 |8 2\p  |a cgwrk  |d 20201028  |q DE-101  |u https://d-nb.info/provenance/plan#cgwrk 
943 1 |a oai:aleph.bib-bvb.de:BVB01-009104501 

Datensatz im Suchindex

_version_ 1819245352214069248
any_adam_object
building Verbundindex
bvnumber BV013350055
callnumber-first T - Technology
callnumber-label TK7874
callnumber-raw TK7874
callnumber-search TK7874
callnumber-sort TK 47874
callnumber-subject TK - Electrical and Nuclear Engineering
classification_rvk ZN 4170
ctrlnum (OCoLC)43591143
(DE-599)BVBBV013350055
dewey-full 621.3815/31
dewey-hundreds 600 - Technology (Applied sciences)
dewey-ones 621 - Applied physics
dewey-raw 621.3815/31
dewey-search 621.3815/31
dewey-sort 3621.3815 231
dewey-tens 620 - Engineering and allied operations
discipline Elektrotechnik / Elektronik / Nachrichtentechnik
edition 2. ed.
format Book
fullrecord <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01978nam a2200517 c 4500</leader><controlfield tag="001">BV013350055</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20030502 </controlfield><controlfield tag="007">t|</controlfield><controlfield tag="008">000919s2001 xxuad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0815514441</subfield><subfield code="9">0-8155-1444-1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)43591143</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV013350055</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">xxu</subfield><subfield code="c">US</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-M347</subfield><subfield code="a">DE-634</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield><subfield code="2">21</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Handbook of VLSI microlithography</subfield><subfield code="b">principles, technology, and applications</subfield><subfield code="c">ed. by John N. Helbert</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">2. ed.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Park Ridge, NJ [u.a.]</subfield><subfield code="b">Noyes Publ. [u.a.]</subfield><subfield code="c">2001</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XXI, 1001 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Materials science and processing technology series</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Very large scale integration</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Helbert, John N.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-009104501</subfield></datafield></record></collection>
id DE-604.BV013350055
illustrated Illustrated
indexdate 2024-12-23T15:26:07Z
institution BVB
isbn 0815514441
language English
oai_aleph_id oai:aleph.bib-bvb.de:BVB01-009104501
oclc_num 43591143
open_access_boolean
owner DE-703
DE-898
DE-BY-UBR
DE-M347
DE-634
owner_facet DE-703
DE-898
DE-BY-UBR
DE-M347
DE-634
physical XXI, 1001 S. Ill., graph. Darst.
publishDate 2001
publishDateSearch 2001
publishDateSort 2001
publisher Noyes Publ. [u.a.]
record_format marc
series2 Materials science and processing technology series
spelling Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert
2. ed.
Park Ridge, NJ [u.a.] Noyes Publ. [u.a.] 2001
XXI, 1001 S. Ill., graph. Darst.
txt rdacontent
n rdamedia
nc rdacarrier
Materials science and processing technology series
Integrated circuits Very large scale integration
Microlithography
Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf
VLSI (DE-588)4117388-0 gnd rswk-swf
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf
VLSI (DE-588)4117388-0 s
Lithografie Halbleitertechnologie (DE-588)4191584-7 s
DE-604
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s
1\p DE-604
Elektronenstrahllithografie (DE-588)4151897-4 s
2\p DE-604
Helbert, John N. Sonstige oth
1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle Handbook of VLSI microlithography principles, technology, and applications
Integrated circuits Very large scale integration
Microlithography
Elektronenstrahllithografie (DE-588)4151897-4 gnd
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd
VLSI (DE-588)4117388-0 gnd
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
subject_GND (DE-588)4151897-4
(DE-588)4174516-4
(DE-588)4117388-0
(DE-588)4191584-7
title Handbook of VLSI microlithography principles, technology, and applications
title_auth Handbook of VLSI microlithography principles, technology, and applications
title_exact_search Handbook of VLSI microlithography principles, technology, and applications
title_full Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert
title_fullStr Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert
title_full_unstemmed Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert
title_short Handbook of VLSI microlithography
title_sort handbook of vlsi microlithography principles technology and applications
title_sub principles, technology, and applications
topic Integrated circuits Very large scale integration
Microlithography
Elektronenstrahllithografie (DE-588)4151897-4 gnd
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd
VLSI (DE-588)4117388-0 gnd
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
topic_facet Integrated circuits Very large scale integration
Microlithography
Elektronenstrahllithografie
Fotolithografie Halbleitertechnologie
VLSI
Lithografie Halbleitertechnologie
work_keys_str_mv AT helbertjohnn handbookofvlsimicrolithographyprinciplestechnologyandapplications