Handbook of VLSI microlithography principles, technology, and applications
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Format: | Buch |
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Sprache: | English |
Veröffentlicht: |
Park Ridge, NJ [u.a.]
Noyes Publ. [u.a.]
2001
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Ausgabe: | 2. ed. |
Schriftenreihe: | Materials science and processing technology series
|
Schlagworte: | |
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MARC
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245 | 1 | 0 | |a Handbook of VLSI microlithography |b principles, technology, and applications |c ed. by John N. Helbert |
250 | |a 2. ed. | ||
264 | 1 | |a Park Ridge, NJ [u.a.] |b Noyes Publ. [u.a.] |c 2001 | |
300 | |a XXI, 1001 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 0 | |a Materials science and processing technology series | |
650 | 4 | |a Integrated circuits |x Very large scale integration | |
650 | 4 | |a Microlithography | |
650 | 0 | 7 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a VLSI |0 (DE-588)4117388-0 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
689 | 0 | 1 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
689 | 0 | |5 DE-604 | |
689 | 1 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
689 | 1 | 1 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
689 | 1 | |8 1\p |5 DE-604 | |
689 | 2 | 0 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |D s |
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700 | 1 | |a Helbert, John N. |e Sonstige |4 oth | |
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-009104501 |
Datensatz im Suchindex
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any_adam_object | |
building | Verbundindex |
bvnumber | BV013350055 |
callnumber-first | T - Technology |
callnumber-label | TK7874 |
callnumber-raw | TK7874 |
callnumber-search | TK7874 |
callnumber-sort | TK 47874 |
callnumber-subject | TK - Electrical and Nuclear Engineering |
classification_rvk | ZN 4170 |
ctrlnum | (OCoLC)43591143 (DE-599)BVBBV013350055 |
dewey-full | 621.3815/31 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/31 |
dewey-search | 621.3815/31 |
dewey-sort | 3621.3815 231 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
edition | 2. ed. |
format | Book |
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id | DE-604.BV013350055 |
illustrated | Illustrated |
indexdate | 2024-12-23T15:26:07Z |
institution | BVB |
isbn | 0815514441 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009104501 |
oclc_num | 43591143 |
open_access_boolean | |
owner | DE-703 DE-898 DE-BY-UBR DE-M347 DE-634 |
owner_facet | DE-703 DE-898 DE-BY-UBR DE-M347 DE-634 |
physical | XXI, 1001 S. Ill., graph. Darst. |
publishDate | 2001 |
publishDateSearch | 2001 |
publishDateSort | 2001 |
publisher | Noyes Publ. [u.a.] |
record_format | marc |
series2 | Materials science and processing technology series |
spelling | Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert 2. ed. Park Ridge, NJ [u.a.] Noyes Publ. [u.a.] 2001 XXI, 1001 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science and processing technology series Integrated circuits Very large scale integration Microlithography Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf VLSI (DE-588)4117388-0 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s DE-604 Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s 1\p DE-604 Elektronenstrahllithografie (DE-588)4151897-4 s 2\p DE-604 Helbert, John N. Sonstige oth 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Handbook of VLSI microlithography principles, technology, and applications Integrated circuits Very large scale integration Microlithography Elektronenstrahllithografie (DE-588)4151897-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd VLSI (DE-588)4117388-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
subject_GND | (DE-588)4151897-4 (DE-588)4174516-4 (DE-588)4117388-0 (DE-588)4191584-7 |
title | Handbook of VLSI microlithography principles, technology, and applications |
title_auth | Handbook of VLSI microlithography principles, technology, and applications |
title_exact_search | Handbook of VLSI microlithography principles, technology, and applications |
title_full | Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert |
title_fullStr | Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert |
title_full_unstemmed | Handbook of VLSI microlithography principles, technology, and applications ed. by John N. Helbert |
title_short | Handbook of VLSI microlithography |
title_sort | handbook of vlsi microlithography principles technology and applications |
title_sub | principles, technology, and applications |
topic | Integrated circuits Very large scale integration Microlithography Elektronenstrahllithografie (DE-588)4151897-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd VLSI (DE-588)4117388-0 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
topic_facet | Integrated circuits Very large scale integration Microlithography Elektronenstrahllithografie Fotolithografie Halbleitertechnologie VLSI Lithografie Halbleitertechnologie |
work_keys_str_mv | AT helbertjohnn handbookofvlsimicrolithographyprinciplestechnologyandapplications |