Sub-half-micron lithography for ULSIs

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Sprache:English
Veröffentlicht: Cambridge [u.a.] Cambridge Univ. Press 2000
Ausgabe:1. publ.
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MARC

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245 1 0 |a Sub-half-micron lithography for ULSIs  |c ed. by Katsumi Suzuki ... 
250 |a 1. publ. 
264 1 |a Cambridge [u.a.]  |b Cambridge Univ. Press  |c 2000 
300 |a XVII, 323 S.  |b Ill., graph. Darst. 
336 |b txt  |2 rdacontent 
337 |b n  |2 rdamedia 
338 |b nc  |2 rdacarrier 
650 4 |a Integrated circuits - Ultra large scale integration 
650 4 |a Photolithography 
650 4 |a Integrated circuits  |x Ultra large scale integration  |x Design and construction 
650 4 |a Microlithography 
650 4 |a Printed circuits  |x Design and construction 
650 0 7 |a ULSI  |0 (DE-588)4226286-0  |2 gnd  |9 rswk-swf 
650 0 7 |a Lithografie  |g Halbleitertechnologie  |0 (DE-588)4191584-7  |2 gnd  |9 rswk-swf 
689 0 0 |a ULSI  |0 (DE-588)4226286-0  |D s 
689 0 1 |a Lithografie  |g Halbleitertechnologie  |0 (DE-588)4191584-7  |D s 
689 0 |5 DE-604 
700 1 |a Suzuki, Katsumi  |e Sonstige  |4 oth 
943 1 |a oai:aleph.bib-bvb.de:BVB01-008887029 

Datensatz im Suchindex

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dewey-ones 621 - Applied physics
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dewey-sort 3621.39 15
dewey-tens 620 - Engineering and allied operations
discipline Elektrotechnik / Elektronik / Nachrichtentechnik
edition 1. publ.
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illustrated Illustrated
indexdate 2024-12-23T15:18:27Z
institution BVB
isbn 0521570808
language English
oai_aleph_id oai:aleph.bib-bvb.de:BVB01-008887029
oclc_num 40646589
open_access_boolean
owner DE-703
owner_facet DE-703
physical XVII, 323 S. Ill., graph. Darst.
publishDate 2000
publishDateSearch 2000
publishDateSort 2000
publisher Cambridge Univ. Press
record_format marc
spelling Sub-half-micron lithography for ULSIs ed. by Katsumi Suzuki ...
1. publ.
Cambridge [u.a.] Cambridge Univ. Press 2000
XVII, 323 S. Ill., graph. Darst.
txt rdacontent
n rdamedia
nc rdacarrier
Integrated circuits - Ultra large scale integration
Photolithography
Integrated circuits Ultra large scale integration Design and construction
Microlithography
Printed circuits Design and construction
ULSI (DE-588)4226286-0 gnd rswk-swf
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf
ULSI (DE-588)4226286-0 s
Lithografie Halbleitertechnologie (DE-588)4191584-7 s
DE-604
Suzuki, Katsumi Sonstige oth
spellingShingle Sub-half-micron lithography for ULSIs
Integrated circuits - Ultra large scale integration
Photolithography
Integrated circuits Ultra large scale integration Design and construction
Microlithography
Printed circuits Design and construction
ULSI (DE-588)4226286-0 gnd
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
subject_GND (DE-588)4226286-0
(DE-588)4191584-7
title Sub-half-micron lithography for ULSIs
title_auth Sub-half-micron lithography for ULSIs
title_exact_search Sub-half-micron lithography for ULSIs
title_full Sub-half-micron lithography for ULSIs ed. by Katsumi Suzuki ...
title_fullStr Sub-half-micron lithography for ULSIs ed. by Katsumi Suzuki ...
title_full_unstemmed Sub-half-micron lithography for ULSIs ed. by Katsumi Suzuki ...
title_short Sub-half-micron lithography for ULSIs
title_sort sub half micron lithography for ulsis
topic Integrated circuits - Ultra large scale integration
Photolithography
Integrated circuits Ultra large scale integration Design and construction
Microlithography
Printed circuits Design and construction
ULSI (DE-588)4226286-0 gnd
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
topic_facet Integrated circuits - Ultra large scale integration
Photolithography
Integrated circuits Ultra large scale integration Design and construction
Microlithography
Printed circuits Design and construction
ULSI
Lithografie Halbleitertechnologie
work_keys_str_mv AT suzukikatsumi subhalfmicronlithographyforulsis