Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy
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| Format: | Buch |
| Sprache: | English |
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1993
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| 100 | 1 | |a Wang, Chunlin |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy |c Chunlin Wang |
| 264 | 1 | |c 1993 | |
| 300 | |a 138 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 500 | |a München, Techn. Univ., Diss., 1993 | ||
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Datensatz im Suchindex
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| author | Wang, Chunlin |
| author_facet | Wang, Chunlin |
| author_role | aut |
| author_sort | Wang, Chunlin |
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| bvnumber | BV009891420 |
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| illustrated | Illustrated |
| indexdate | 2024-12-23T13:41:57Z |
| institution | BVB |
| language | English |
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| physical | 138 S. Ill., graph. Darst. |
| publishDate | 1993 |
| publishDateSearch | 1993 |
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| spelling | Wang, Chunlin Verfasser aut Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy Chunlin Wang 1993 138 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier München, Techn. Univ., Diss., 1993 Einkristall (DE-588)4013901-3 gnd rswk-swf Silan (DE-588)4337259-4 gnd rswk-swf Disilan (DE-588)4150150-0 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Epitaxieschicht (DE-588)4152546-2 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Plasmaätzen (DE-588)4174821-9 s Silicium (DE-588)4077445-4 s Einkristall (DE-588)4013901-3 s DE-604 Epitaxieschicht (DE-588)4152546-2 s Disilan (DE-588)4150150-0 s CVD-Verfahren (DE-588)4009846-1 s Silan (DE-588)4337259-4 s DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006549278&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Wang, Chunlin Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy Einkristall (DE-588)4013901-3 gnd Silan (DE-588)4337259-4 gnd Disilan (DE-588)4150150-0 gnd Plasmaätzen (DE-588)4174821-9 gnd Epitaxieschicht (DE-588)4152546-2 gnd CVD-Verfahren (DE-588)4009846-1 gnd Silicium (DE-588)4077445-4 gnd |
| subject_GND | (DE-588)4013901-3 (DE-588)4337259-4 (DE-588)4150150-0 (DE-588)4174821-9 (DE-588)4152546-2 (DE-588)4009846-1 (DE-588)4077445-4 (DE-588)4113937-9 |
| title | Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy |
| title_auth | Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy |
| title_exact_search | Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy |
| title_full | Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy Chunlin Wang |
| title_fullStr | Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy Chunlin Wang |
| title_full_unstemmed | Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy Chunlin Wang |
| title_short | Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy |
| title_sort | etching of single crystalline silicon by hydrogen plasma and silicon deposition from si2h6 and sih4 for low temperature silicon epitaxy |
| topic | Einkristall (DE-588)4013901-3 gnd Silan (DE-588)4337259-4 gnd Disilan (DE-588)4150150-0 gnd Plasmaätzen (DE-588)4174821-9 gnd Epitaxieschicht (DE-588)4152546-2 gnd CVD-Verfahren (DE-588)4009846-1 gnd Silicium (DE-588)4077445-4 gnd |
| topic_facet | Einkristall Silan Disilan Plasmaätzen Epitaxieschicht CVD-Verfahren Silicium Hochschulschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006549278&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT wangchunlin etchingofsinglecrystallinesiliconbyhydrogenplasmaandsilicondepositionfromsi2h6andsih4forlowtemperaturesiliconepitaxy |