Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices
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| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Dordrecht u.a.
Kluwer
1993
|
| Schriftenreihe: | NATO: [Nato ASI series / E]
234 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
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| 245 | 1 | 0 | |a Multicomponent and multilayered thin films for advanced microtechnologies |b techniques, fundamentals and devices |c ed. by Orlando Auciello ... |
| 264 | 1 | |a Dordrecht u.a. |b Kluwer |c 1993 | |
| 300 | |a XV, 633 S. |b Ill., graph. Darst. | ||
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Datensatz im Suchindex
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|---|---|
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| _version_ | 1816711697509908480 |
| adam_text | MULTICOMPONENT AND MULTILAYERED THIN FILMS FOR ADVANCED
MICROTECHNOLOGIES: TECHNIQUES, FUNDAMENTALS AND DEVICES EDITED BY
ORLANDO AUCIELLO MCNC, CENTER FOR MICROELECTRONICS, SYSTEM TECHNOLOGIES,
RESEARCH TRIANGLE PARK, NORTH CAROLINA, U.S.A. AND JUERGEN ENGEMANN
UNIVERSITY OF WUPPERTAL, MICROSTRUCTURE RESEARCH CENTER, WUPPERTAL,
GERMANY KLUWER ACADEMIC PUBLISHERS DORDRECHT / BOSTON / LONDON PUBLISHED
IN COOPERATION WITH NATO SCIENTIFIC AFFA-TFSTJIVISION TABLE OF CONTENTS
PREFACE REPORT ON THE NATO/ASI ACKNOWLEDGEMENTS PLASMA SPUTTER
DEPOSITION SYSTEMS: PLASMA GENERATION, BASIC PHYSICS AND
CHARACTERIZATION S.M. ROSSNAGEL TECHNOLOGY AND APPLICATION OF
FTLAMENTLESS RF - ION SOURCES IN ION BEAM SPUTTER DEPOSITION J. ENGEMANN
PHYSICS OF FILM GROWTH FROM THE VAPOR PHASE J.E. GREENE TECHNIQUES FOR
THE GROWTH OF CRYSTALLINE FILMS BY MOLECULAR BEAM DEPOSITION J.C. BEAN
DISCHARGE DENSITY INCREASE FOR HIGH RATE MAGNETRON SPUTTERING W.M.
POSADOWSKI ON THE TRANSPORT OF SPUTTERED SPECIES IN PLASMA
SPUTTER-DEPOSITION SYSTEMS J.C. MORENO-MARIN, A. GRAS-MARTI, AND O.
AUCIELLO INFLUENCE OF SPUTTER GAS PRESSURE AND SUBSTRATE BIAS ON
INTRINSIC STRESS AND CRYSTALLINITY OF COATINGS PRODUCED BY MAGNETRON
SPUTTERING V. TEIXEIRA AND M. ANDRITSCHKY SPUTTER DEPOSITION OF
MULTICOMPONENT TARGETS: WHAT PARTS OF THE PROCESS AFFECT THE ELEMENTAL
COMPOSITION OF THE FILM D. THEIRICH A PROPOSITION OF A NOVEL REACTIVE
SPUTTER-DEPOSITION SYSTEM FOR SYNTHESIZING MULTI-COMPONENT MATERIALS S.
MANIV THE INFLUENCE OF PRECURSORS ON THE PREPARATION OF THIN PYRITE
FILMS BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION * HOEPFNER, A. ENNAOUI,
K. ELLMER, AND S. FIECHTER MODELLING OF THE INTRINSIC STRESS IN
PVD-COATINGS M. ANDRITSCHKY AND V. TEIXEIRA PHYSICAL VAPOR DEPOSITION OF
MULTICOMPONENT OXIDE THIN FILMS: TECHNIQUES, BASIC DEPOSITION PROCESSES
AND FILM PROCESSING-MICROSTRUCTURE-PROPERTY RELATIONSHIPS O. AUCIELLO,
A.I. KINGON, A.R. KRAUSS, AND D.J. LICHTENWALNER 151 PULSED LASER
DEPOSITED METAL-OXIDE BASED SUPERCONDUCTOR, SEMICONDUCTOR AND DIELECTRIC
HETEROSTRUCTURES AND SUPERLATTICES T. VENKATESAN, S. BHATTACHARYA, *
DOUGHTY, A. FINDIKOGLU, C. KWON, QI LI, S.N. MAO, A. WALKENHORST, AND
X.X. XI 209 SYNTHESIS OF OPTICAL THIN FILMS: FUNDAMENTALS AND
APPLICATIONS R.P. HOWSON 239 ION BEAM-BASED CHARACTERIZATION OF
MULTICOMPONENT OXIDE THIN FILMS AND THIN FILM LAYERED STRUCTURES A.R.
KRAUSS, M. RANGASWAMY, Y. LIN, D.M. GRUEN, J.A. SCHULTZ, H.K. SCHMIDT,
AND R.P.H. CHANG 251 ELECTRON SPECTROSCOPIC ANALYSIS OF MULTICOMPONENT
THIN FILMS WITH PARTICULAR EMPHASIS ON OXIDES T.L. BARR 283 TRANSMISSION
ELECTRON MICROSCOPY OF OXIDE THIN FILMS R. RAMESH 311 LASER DEPOSITION
OF HTSC FILMS: EXPANSION OF THE LASER PLASMA, DEPOSITION OF PARTICLES,
FORMATION OF THE CRYSTAL STRUCTURE AND SUPERCONDUCTING PROPERTIES OF
FILMS M.R. PREDTECHENSKY 357 YBACUO FILMS BY PULSED LASER DEPOSITION AND
SPUTTERING T. KOGA, J.H. XU, B.M. MOON, AND K.V. RAO 369 TRANSVERSE
ELECTROOPTIC PROPERTIES OF MAGNETRON SPUTTERED PLZT THIN FILMS F. WANG
AND G.H. HAERTLING 375 LEAD ZIRCONATE TITAN ATE FERROELECTRIC THIN FILMS
BY LASER ABLATION DEPOSITION U. VARSHNEY 381 PHOTO VOLTAIC PROPERTIES OF
REACTIVE THERMAL EVAPORATED INDIUM OXIDE (10)/ SILICON JUNCTIONS A.
SUBRAHMANYAM 389 IN SITU COMPOSITIONAL ANALYSIS OF MULTIELEMENT THIN
FILMS T.A. ROBERTS, J.M. GRACE, D.B. MCDONALD, K.E. GRAY AND R.P.H.
CHANG 395 SI-GE STRAINED LAYER HETEROSTRUCTURES: DEVICE POSSIBILITIES
AND PROCESS LIMITATIONS D.C. HOUGHTON, J.-P. NOEL, N.L. ROWELL, AND D.D.
PEROVIC 401 GROWTH, PROPERTIES AND APPLICATIONS OF EPITAXIAL SILICIDES
S. MANU 445 DEPOSITION FUNDAMENTALS AND PROPERTIES OF METALLIC AND
DIFFUSION BARRIER FILMS Y. PAULEAU 471 EPITAXIAL COSI 2 FORMATION ON
(001) SI USING SEQUENTIALLY DEPOSITED TI-CO BILAYERS S.L. HSIA, T.Y.
TAN, P.L. SMITH, AND G.E. MCGUIRE 523 STRESS IN SI LX GE X FILMS
PREPARED BY ION BEAM SPUTTERING F.MEYER, Y. LEMEUR, C.SCHWEBEL,
C.PELLET, P.MOELLER, A.BUXBAUM, A.RAIZMAN, AND M.EIZENBERG 527 BAND
ENGINEERING OF HIGH BANDGAP SEMICONDUCTORS BY SUPERLATTICES Z. SITAR 533
CHARACTERIZATION OF TUNGSTEN FILMS AND HARD TUNGSTEN- CARBON COATINGS
PREPARED BY DC MAGNETRON SPUTTERING PROCESS PH. GOUY-PAILLER AND Y.
PAULEAU 539 PULSED EXCIMER LASER INDUCED REACTIONS AT THE TUNGSTEN-
SILICON INTERFACE S. LUBY, E. MAJKOVA, V. DANISKA, R. SENDERAK, E.
D ARMA, G. LEGGIERI, A. LUCHES, AND M. MARTINO 545 RAPID PULSED C0 2 -
LASER ANNEALING OF SILICON-NITRIDE / SILICON INTERFACE STATES J. MEIXNER
AND R. HEZEL 551 INTERFACE PROPERTIES OF ANODIC SULFIDE AND SULFIDE-
OXIDE FILMS ON N-INSB Z. Z. OZTURK, A. ALTINDAL, AND H. YUZER 557 SPIN
GLASS LIKE BEHAVIOR IN CR-CU MULTILAYERS S. VITTA 561 HIGH TEMPERATURE
SUPERCONDUCTING THIN FILM-BASED DEVICES C. HEIDEN 567 FERROELECTRIC THIN
FILMS AND DEVICE APPLICATIONS S.B. KRUPANIDHI 601 PHASE LOCKING IN
SERIES-CONNECTED NB-AL-NB PLANAR JOSEPHSON WEAK LINKS K. SAITOH, M.
HATANO, AND T. NISHINO 627 INDEX 631
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| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
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| genre_facet | Konferenzschrift 1992 Windsheim |
| id | DE-604.BV009753933 |
| illustrated | Illustrated |
| indexdate | 2024-11-25T17:14:19Z |
| institution | BVB |
| isbn | 0792322657 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006451214 |
| oclc_num | 27812402 |
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| owner_facet | DE-91 DE-BY-TUM DE-703 DE-634 DE-83 |
| physical | XV, 633 S. Ill., graph. Darst. |
| publishDate | 1993 |
| publishDateSearch | 1993 |
| publishDateSort | 1993 |
| publisher | Kluwer |
| record_format | marc |
| series2 | NATO: [Nato ASI series / E] |
| spellingShingle | Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices Thin film devices Congresses Thin films Congresses Mehrschichtsystem (DE-588)4244347-7 gnd Dünnschichttechnik (DE-588)4136339-5 gnd |
| subject_GND | (DE-588)4244347-7 (DE-588)4136339-5 (DE-588)1071861417 |
| title | Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices |
| title_auth | Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices |
| title_exact_search | Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices |
| title_full | Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices ed. by Orlando Auciello ... |
| title_fullStr | Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices ed. by Orlando Auciello ... |
| title_full_unstemmed | Multicomponent and multilayered thin films for advanced microtechnologies techniques, fundamentals and devices ed. by Orlando Auciello ... |
| title_short | Multicomponent and multilayered thin films for advanced microtechnologies |
| title_sort | multicomponent and multilayered thin films for advanced microtechnologies techniques fundamentals and devices |
| title_sub | techniques, fundamentals and devices |
| topic | Thin film devices Congresses Thin films Congresses Mehrschichtsystem (DE-588)4244347-7 gnd Dünnschichttechnik (DE-588)4136339-5 gnd |
| topic_facet | Thin film devices Congresses Thin films Congresses Mehrschichtsystem Dünnschichttechnik Konferenzschrift 1992 Windsheim |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006451214&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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