Plasma etching in semiconductor fabrication
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| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Amsterdam u.a.
Elsevier
1985
|
| Schriftenreihe: | Plasma technology.
1. |
| Schlagworte: | |
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MARC
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| 100 | 1 | |a Morgan, Russ A. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Plasma etching in semiconductor fabrication |
| 264 | 1 | |a Amsterdam u.a. |b Elsevier |c 1985 | |
| 300 | |a X, 316 S. |b Ill., graph. Darst. | ||
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Datensatz im Suchindex
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| author | Morgan, Russ A. |
| author_facet | Morgan, Russ A. |
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| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV002186639 |
| illustrated | Illustrated |
| indexdate | 2024-11-25T17:10:36Z |
| institution | BVB |
| isbn | 0444424695 0444424199 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001436293 |
| oclc_num | 11784503 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-355 DE-BY-UBR DE-29T |
| owner_facet | DE-91 DE-BY-TUM DE-355 DE-BY-UBR DE-29T |
| physical | X, 316 S. Ill., graph. Darst. |
| publishDate | 1985 |
| publishDateSearch | 1985 |
| publishDateSort | 1985 |
| publisher | Elsevier |
| record_format | marc |
| series | Plasma technology. |
| series2 | Plasma technology. |
| spellingShingle | Morgan, Russ A. Plasma etching in semiconductor fabrication Plasma technology. Plasma etching Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiterindustrie (DE-588)4158803-4 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Bearbeitung (DE-588)4120981-3 gnd Halbleiter (DE-588)4022993-2 gnd Plasmastrahl (DE-588)4206366-8 gnd |
| subject_GND | (DE-588)4174821-9 (DE-588)4158803-4 (DE-588)4158814-9 (DE-588)4120981-3 (DE-588)4022993-2 (DE-588)4206366-8 |
| title | Plasma etching in semiconductor fabrication |
| title_auth | Plasma etching in semiconductor fabrication |
| title_exact_search | Plasma etching in semiconductor fabrication |
| title_full | Plasma etching in semiconductor fabrication |
| title_fullStr | Plasma etching in semiconductor fabrication |
| title_full_unstemmed | Plasma etching in semiconductor fabrication |
| title_short | Plasma etching in semiconductor fabrication |
| title_sort | plasma etching in semiconductor fabrication |
| topic | Plasma etching Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiterindustrie (DE-588)4158803-4 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Bearbeitung (DE-588)4120981-3 gnd Halbleiter (DE-588)4022993-2 gnd Plasmastrahl (DE-588)4206366-8 gnd |
| topic_facet | Plasma etching Semiconductors Etching Plasmaätzen Halbleiterindustrie Halbleitertechnologie Bearbeitung Halbleiter Plasmastrahl |
| volume_link | (DE-604)BV001897163 |
| work_keys_str_mv | AT morganrussa plasmaetchinginsemiconductorfabrication |