Plasmas for additive manufacturing

Additive methods for manufacturing materials have recently emerged, particularly for the fabrication of three‐dimensional architectures. Because of their long history in thin‐film etching and deposition, plasmas offer unique advantages for many of the materials and surface processes associated with additive manufacturing. Here, we review recent efforts that have been primarily focused on the direct writing of patterned structures and the post‐treatment of printed materials. Different configurations, materials, and applications are presented. Current challenges and a future outlook are also provided. This review presents a summary of the progress‐to‐date and insights into the emerging potential of plasma‐based processes for additive manufacturing. Highlights include the direct deposition of in‐flight synthesized or modified nanoparticles and the conversion of printed particle‐free, molecular precursor inks. Future challenges are also described to reveal a path for disruption in this exciting and rapidly growing field.