Numerical Analysis of Substrate-Incident Carbon Flux in Low-Pressure Radio-Frequency CH4 Plasmas for Deposition of Diamond-Like Carbon Films

SUMMARY Capacitively coupled hydrocarbon (CH4) plasmas used in the deposition of diamond‐like carbon films have been simulated using a self‐consistent one‐dimensional fluid model, incorporating the mass balance equations for electrons, ions, radicals, and nonradicals, as well as the electron energy...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Electronics and communications in Japan 2015-09, Vol.98 (9), p.31-39
Hauptverfasser:	ODA, AKINORI, KOUSAKA, HIROYUKI
Format:	Artikel
Sprache:	eng
Schlagworte:	diamond-like carbon methane numerical simulation radio-frequency plasmas
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!