Ultrafast laser plasma assisted rare-earth doping for silicon photonics

Ultrafast laser plasma assisted rare-earth doping for silicon photonics

A novel technique for rare-earth doping in silica is developed with femtosecond laser plasma processing and record high concentration of erbium in silica/silica-on-silicon platforms to realize compact optical amplifiers for silicon photonics are achieved.

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Bibliographische Detailangaben
Hauptverfasser: Jose, G, Chandrappan, J, Kamil, SA, Murray, M, Zolnai, Z, Agocs, E, Petrik, P, Steenson, P, Krauss, T
Format: Tagungsbericht
Sprache:eng
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Beschreibung
Zusammenfassung:A novel technique for rare-earth doping in silica is developed with femtosecond laser plasma processing and record high concentration of erbium in silica/silica-on-silicon platforms to realize compact optical amplifiers for silicon photonics are achieved.
DOI:10.1364/CLEO_AT.2016.ATu3K.5